Effects of the Annealing Heating Rate on Sputtered Aluminum Oxide Films

被引：3

作者：

Xiufeng, Tang ^{[1
,2
]}

机构：

[1] Wuyl Univ, Sch Appl Phys & Mat, Jiangmen 529020, Peoples R China

[2] Northwestern Polytech Univ, Sch Mat Sci & Engn, State Key Lab Solidificat Proc, Xian 710072, Peoples R China

来源：

JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION | 2017年 / 32卷 / 01期

关键词：

aluminum oxide film; sputtering; annealing heating rate; microstructure; THERMAL-STABILITY; THIN-FILMS; AL2O3; FILM; DEPOSITION; COATINGS; CRYSTALLIZATION; BEHAVIOR; GROWTH;

D O I：

10.1007/s11595-017-1565-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

AlxOy films by DC reactive magnetron sputtering were annealed in air ambient at 500 degrees C for 1 h with different heating rates of 5, 15, and 25 degrees C/min. Then heat treatments at 900 degrees C were carried out on these 500 degrees C-annealed films to simulate the high-temperature application environment. Effects of the annealing heating rate on structure and properties of both 500 degrees C-annealed and 900 degrees C-heated films were investigated systematically. It was found that distinct gamma-Al2O3 crystallization was observed in the 900 degrees C-heated films only when the annealing heating rates are 15 and 25 degrees C/min. The 500 degrees C-annealed film possessed the most compact surface morphology in the case of 25 degrees C/min. The highest microhardness of both 500 degrees C-annealed and 900 degrees C-heated films were obtained when the annealing heating rate was 15 degrees C/min.

引用

页码：94 / 99

页数：6

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