Annealing of Ni80Fe20/Cu and Co/Cu multilayers

被引:29
作者
van Loyen, L [1 ]
Elefant, D [1 ]
Tietjen, D [1 ]
Schneider, CM [1 ]
Hecker, M [1 ]
Thomas, J [1 ]
机构
[1] Inst Solid State & Mat Res, Dept Thin Films & Nanostruct, D-01069 Dresden, Germany
关键词
D O I
10.1063/1.373180
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ni80Fe20/Cu and Co/Cu multilayers with Cu layer thicknesses corresponding to the first and second antiferromagnetic (afm) coupling maximum were prepared by dc-magnetron sputtering and investigated with respect to their annealing behavior. The as-deposited films showed giant magnetoresistance (GMR) up to 50% at room temperature. The annealing behavior of the multilayers belonging to the same Cu layer thickness is found to be very similar up to 200 degrees C. For both kind of multilayers with a Cu layer thickness of about 1 nm (first afm maximum) the GMR degrades upon annealing in excess of 140 degrees C. However, with a Cu layer thickness of about 2 nm (second afm maximum) the multilayers are stable with respect to their GMR properties even after prolonged exposure up to 200 degrees C. Moreover, in some cases even an improvement of GMR upon the annealing procedure may be found. (C) 2000 American Institute of Physics. [S0021-8979(00)58008-6].
引用
收藏
页码:4852 / 4854
页数:3
相关论文
共 7 条
[1]   Effect of annealing on the magnetic properties of sputtered Co Cu multilayers [J].
Albini, L ;
Carlotti, G ;
Gubbiotti, G ;
Pareti, L ;
Socino, G ;
Turilli, G .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1999, 198-99 :363-365
[2]  
BenYoussef J, 1997, J MAGN MAGN MATER, V165, P288, DOI 10.1016/S0304-8853(96)00531-8
[3]   Highly field sensitive and thermally stable DC magnetron sputtered soft Ni81Fe19/Cu multilayers [J].
Huai, YM ;
Tan, MS ;
Rottmayer, R .
IEEE TRANSACTIONS ON MAGNETICS, 1998, 34 (04) :918-920
[4]   OSCILLATIONS IN GIANT MAGNETORESISTANCE AND ANTIFERROMAGNETIC COUPLING IN [NI81FE19/CU]N MULTILAYERS [J].
PARKIN, SSP .
APPLIED PHYSICS LETTERS, 1992, 60 (04) :512-514
[5]   GIANT MAGNETORESISTANCE IN ANTIFERROMAGNETIC CO/CU MULTILAYERS [J].
PARKIN, SSP ;
LI, ZG ;
SMITH, DJ .
APPLIED PHYSICS LETTERS, 1991, 58 (23) :2710-2712
[6]   Evolution of microstructure and magnetoresistance in Co/Cu multilayers during annealing [J].
Rätzke, K ;
Hall, MJ ;
Jardine, DB ;
Shih, WC ;
Somekh, RE ;
Greer, AL .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1999, 204 (1-2) :61-67
[7]   Presence and absence of antiferromagnetic coupling and giant magnetoresistance in sputtered and evaporated permalloy/copper multilayers [J].
Reiss, G ;
van Loyen, L ;
Lucinski, T ;
Elefant, D ;
Bruckl, H ;
Mattern, N ;
Rennekamp, R ;
Ernst, W .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1998, 184 (03) :281-288