Determination of carbon-related trap energy level in (Al)GaN buffers for high electron mobility transistors through a room-temperature approach

被引:18
作者
Chen, Xin [1 ,2 ,3 ]
Zhong, Yaozong [3 ,4 ]
Zhou, Yu [3 ,4 ,5 ]
Gao, Hongwei [3 ]
Zhan, Xiaoning [3 ]
Su, Shuai [3 ,4 ]
Guo, Xiaolu [3 ,4 ]
Sun, Qian [3 ,4 ,5 ]
Zhang, Zihui [1 ,2 ]
Bi, Wengang [1 ,2 ]
Yang, Hui [3 ,4 ]
机构
[1] Hebei Univ Technol, State Key Lab Reliabil & Intelligence Elect Equip, 5340 Xiping Rd, Tianjin 300401, Peoples R China
[2] Hebei Univ Technol, Sch Elect & Informat Engn, Tianjin Key Lab Elect Mat & Devices, 5340 Xiping Rd, Tianjin 300401, Peoples R China
[3] Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Peoples R China
[4] Univ Sci & Technol China, Sch Nano Technol & Nano Bion, Hefei 230026, Peoples R China
[5] Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Foshan 528000, Peoples R China
关键词
DYNAMIC R-ON; C-DOPED GAN; CURRENT COLLAPSE; ALGAN/GAN HEMTS; GATE; SUBSTRATE; SURFACE; GROWTH;
D O I
10.1063/5.0031029
中图分类号
O59 [应用物理学];
学科分类号
摘要
A room-temperature method to determine the trap energy levels in the carbon-doped (Al)GaN buffers is developed via a transient current measurement on the AlGaN/GaN high electron mobility transistors under back-gate voltages combined with a measurement of the buffer vertical leakage. Under high back-gate voltages, a linear relationship is obtained between the trap energy levels and the square roots of electric field strength, suggesting that the vertical conduction in the C-doped buffer follows the Poole-Frenkel law. The trap energy level in C-doped Al0.07Ga0.93N is finally determined to be 1.1eV through the established room-temperature approach, while that in C-doped GaN is extracted to be 0.9eV, both of which are related to the carbon impurities.
引用
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页数:7
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