In situ characterization of residual stress evolution during heat treatment of SiC/SiC ceramic matrix composites using high-energy X-ray diffraction

被引:11
作者
Knauf, Michael W. [1 ]
Przybyla, Craig P. [2 ]
Shade, Paul A. [2 ]
Park, Jun-Sang [3 ]
Ritchey, Andrew J. [4 ]
Trice, Rodney W. [5 ]
Pipes, R. B. [1 ,5 ,6 ]
机构
[1] Purdue Univ, Sch Aeronaut & Astronaut, W Lafayette, IN 47907 USA
[2] Air Force Res Lab, Mat & Mfg Directorate, Wright Patterson Air For, OH USA
[3] Argonne Natl Lab, Adv Photon Source, Lemont, IL USA
[4] Rolls Royce Corp, Indianapolis, IN USA
[5] Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
[6] Purdue Univ, Sch Chem Engn, W Lafayette, IN 47907 USA
关键词
ceramic matrix composites; heat treatment; stress relaxation; THERMAL-EXPANSION; ELECTRICAL-RESISTANCE; MECHANICAL-PROPERTIES; LATTICE-PARAMETER; HIGH-TEMPERATURE; YOUNGS MODULUS; SILICON; BORON; MICROSTRESS; MODEL;
D O I
10.1111/jace.17493
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Volumetric strains were measured in silicon carbide/silicon carbide melt-infiltrated ceramic matrix composites (CMCs) at ambient and high temperatures using high-energy synchrotron X-ray diffraction (XRD). Both silicon and silicon carbide constituents were interrogated utilizing a broad spectrum of diffracting planes that would be largely inaccessible to common laboratory XRD equipment. Residual room-temperature principal strains in the melt-infiltrated silicon phase were found to be approximately 1100 mu epsilon in compression, corresponding to stresses of approximately 300 MPa using simplifying constitutive assumptions. Residual room-temperature principal strains in silicon carbide particles found throughout the matrix were approximately 500 mu epsilon in tension, corresponding to approximately 300 MPa. Residual strains were found to decrease considerably as temperatures increased from ambient temperature to 1250 degrees C. Residual strains returned to approximately preheat treatment values after cool-down to ambient temperature. Strain measurements in the silicon phase were found to be significantly affected by dissolved boron dopant levels causing contraction of the silicon lattice. This contraction must be accounted for in high-temperature experiments for accurate calculation of stresses in the silicon phase.
引用
收藏
页码:1424 / 1435
页数:12
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