Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns

被引：243
作者：
Jung, Yeon Sik [1 ]
Ross, Caroline A. [1 ]
机构：
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
来源：
ADVANCED MATERIALS | 2009年 / 21卷 / 24期
关键词：
THIN-FILMS; MORPHOLOGY; ALIGNMENT; GRAPHOEPITAXY; LITHOGRAPHY; INTERFACE; POLYMERS; ARRAYS;
D O I：
10.1002/adma.200802855
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Self-assembly of a block copolymer into cylindrical and/or perforated lamellar arrays within substrate trenches can be extensively tuned during the solvent-annealing process. Following reactive-ion etching SEM images reveal that the, solvent mixing ratio and the vapor pressure determine the type of array obtained and influence the dimensions of the repeat unit.
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收藏
页码：2540 / +
页数：7
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