Grain boundary transport through thermally grown alumina scales on NiAl

被引:8
作者
Barth, Talia L. [1 ]
Weber, Peter K. [2 ]
Liu, Tian [1 ]
Xue, Fei [1 ]
Valenza, Thomas C. [1 ]
Backman, Lavina [3 ]
Opila, Elizabeth [3 ]
Marquis, Emmanuelle A. [1 ]
机构
[1] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
[2] Lawrence Livermore Natl Lab, Phys & Life Sci, Livermore, CA USA
[3] Univ Virginia, Dept Mat Sci & Engn, Charlottesville, VA USA
基金
美国国家科学基金会;
关键词
NiAl; Oxidation; Grain boundary; NanoSIMS; APT; TEMPERATURE OXIDATION BEHAVIOR; 2 REACTIVE ELEMENTS; CR-AL ALLOYS; STRESS DEVELOPMENT; CREEP RESISTANCE; TI ADDITIONS; YTTRIUM; MICROSTRUCTURE; SEGREGATION; DIFFUSION;
D O I
10.1016/j.corsci.2022.110798
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The oxidation resistance of Ni-based alloys is typically improved by additions of elements segregating to grain boundaries, contributing to reducing scale growth, and improving scale adherence. To develop a mechanistic understanding of doping, outward Al and inward O fluxes through the scale formed on beta-NiAl with Ti, Y, and Ti+Y additions were characterized for oxidation at 1200 degrees C and times up to 100 h. Doped alloys exhibited varying reductions in oxidation rates and Al and O fluxes affecting scale grain morphologies. Ti+Y co-doping further reduced the outward Al and inward O transport compared to doping with Ti or Y alone.
引用
收藏
页数:9
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