PROCESS OPTIMIZATION OF TEMPLATED DSA FLOWS

被引：13

作者：

Gronheid, Roel ^{[1
]}

Bekaert, Joost ^{[1
]}

Kuppuswamy, Vijaya-Kumar Murugesan ^{[1
]}

Vandenbroeck, Nadia ^{[1
]}

Doise, Jan ^{[1
,2
]}

Cao, Yi ^{[3
]}

Lin, Guanyang ^{[3
]}

Sayan, Safak ^{[4
]}

Parnell, Doni ^{[5
]}

Somervell, Mark ^{[5
]}

机构：

[1] IMEC, Kapeldreef 75, B-3001 Louvain, Belgium

[2] Katholieke Univ Leuven, Dept Elect Engn ESAT, Leuven, Belgium

[3] AZ Elect Mat, Branchburg, AZ USA

[4] Intel Corp, Santa Clara, CA 95054 USA

[5] Tokyo Elect Amer, Tokyo, TX 78741 USA

来源：

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXI | 2014年 / 9051卷

关键词：

Directed self-assembly; grapho-epitaxy; templated DSA; cylinders;

D O I：

10.1117/12.2047266

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Directed Self-Assembly (DSA) of Block Co-Polymers (BCP) has become an intense field of study as a potential patterning solution for future generation devices. The most critical challenges that need to be understood and controlled include pattern placement accuracy, achieving low defectivity in DSA patterns and how to make chip designs DSA-friendly. The DSA program at imec includes efforts on these three major topics. Specifically, in this paper the progress in setting up flows for templated DSA within the imec program will be discussed. A process has been implemented based on a hard mask as the template layer. In this paper primarily the impact of local pattern density and BCP film thickness on the templated DSA process are discussed. The open hole rate and the placement accuracy of BCP patterns within the template are the primary figures of merit..

引用

页数：7

共 4 条

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Delgadillo, Paulina Rincon ;

Singh, Arjun ;

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Sayan, Safak ;

Chan, Boon Teik ;

Van Look, Lieve ;

Bekaert, Joost ;

Pollentier, Ivan ;

Nealey, Paul F. .

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2013, 26 (06) :779-791

[3]

Torres A., 2014, P SOC PHOTO-OPT INS, V9052, P9052

[4] Block Copolymer Directed Self-Assembly Enables Sublithographic Patterning for Device Fabrication [J].

Wong, H. -S. Philip ;

Bencher, Chris ;

Yi, He ;

Bao, Xin-Yu ;

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ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES IV, 2012, 8323

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