Oxygen in Czochralski silicon used for solar cells

被引:10
|
作者
Yang, DR [1 ]
Li, DS [1 ]
Wang, LR [1 ]
Ma, XY [1 ]
Que, DL [1 ]
机构
[1] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
关键词
oxygen; Czochralski silicon; annealing; solar cells;
D O I
10.1016/S0927-0248(01)00158-1
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Compared to the Czochralski (CZ) silicon used in microelectronic industry (M-CZ Si), the annealing behavior of oxygen in the CZ silicon used for solar cells (S-CZ Si) was investigated by means of FTIR and SEM. It was found that the oxygen concentration in S-CZ Si crystal was lower than in the M-CZ Si crystal. During single-step annealing in the temperature range of 800-1100degreesC, the oxygen in S-CZ Si was hard to precipitate, even if the material contained higher carbon concentrations. After pre-annealing at 750degreesC, many more oxygen precipitates were formed, The amount and density of the oxygen precipitates were almost the same as in M-CZ Si annealed in single step. It is considered that oxygen has no significant influence on the efficiency of solar cells made from Cz silicon if it is annealed only by a single step in the range of 800-1100degreesC. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:133 / 138
页数:6
相关论文
共 50 条
  • [11] ANOMALOUS OXYGEN PRECIPITATION IN CZOCHRALSKI SILICON
    LIN, W
    OATES, AS
    APPLIED PHYSICS LETTERS, 1990, 56 (02) : 128 - 130
  • [12] Separated striations in n-type Czochralski silicon solar cells
    Li, Guixiu
    Yuan, Shuai
    Zhou, Shenglang
    Wu, Yihua
    Chen, Hongrong
    Zhang, Huali
    Wang, Chen
    Wang, Lei
    Yu, Xuegong
    Yang, Deren
    APPLIED PHYSICS LETTERS, 2024, 124 (25)
  • [13] Oxygen diffusion and precipitation in Czochralski silicon
    Newman, RC
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2000, 12 (25) : R335 - R365
  • [14] Recombination centers in electron-irradiated Czochralski silicon solar cells
    Zazoui, M., 1600, American Inst of Physics, Woodbury, NY, United States (76):
  • [15] OUTDIFFUSION OF OXYGEN AND CARBON IN CZOCHRALSKI SILICON
    SHIMURA, F
    HIGUCHI, T
    HOCKETT, RS
    APPLIED PHYSICS LETTERS, 1988, 53 (01) : 69 - 71
  • [16] OXYGEN SEGREGATION IN CZOCHRALSKI SILICON GROWTH
    LIN, W
    HILL, DW
    JOURNAL OF APPLIED PHYSICS, 1983, 54 (02) : 1082 - 1085
  • [17] Relationship of Free Surface Area with Oxygen Concentration in Silicon Ingot Grown by Czochralski Method for High Efficiency Solar Cells
    Jun-Seong Park
    Tae-Hun Shim
    Jea-Gun Park
    Journal of the Korean Physical Society, 2020, 77 : 940 - 944
  • [18] Relationship of Free Surface Area with Oxygen Concentration in Silicon Ingot Grown by Czochralski Method for High Efficiency Solar Cells
    Park, Jun-Seong
    Shim, Tae-Hun
    Park, Jea-Gun
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2020, 77 (11) : 940 - 944
  • [19] Electrical property of iron-related defects in n-type dislocated Czochralski silicon crystal used for solar cells
    Gao, Siwei
    Yuan, Shuai
    Hu, Zechen
    Yu, Xuegong
    Zhu, Xiaodong
    Yang, Deren
    APPLIED PHYSICS EXPRESS, 2021, 14 (03)
  • [20] RECOMBINATION CENTERS IN ELECTRON-IRRADIATED CZOCHRALSKI SILICON SOLAR-CELLS
    ZAZOUI, M
    BOURGOIN, JC
    STIEVENARD, D
    DERESMES, D
    STROBL, G
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (02) : 815 - 819