Oxygen in Czochralski silicon used for solar cells

被引:10
|
作者
Yang, DR [1 ]
Li, DS [1 ]
Wang, LR [1 ]
Ma, XY [1 ]
Que, DL [1 ]
机构
[1] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
关键词
oxygen; Czochralski silicon; annealing; solar cells;
D O I
10.1016/S0927-0248(01)00158-1
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Compared to the Czochralski (CZ) silicon used in microelectronic industry (M-CZ Si), the annealing behavior of oxygen in the CZ silicon used for solar cells (S-CZ Si) was investigated by means of FTIR and SEM. It was found that the oxygen concentration in S-CZ Si crystal was lower than in the M-CZ Si crystal. During single-step annealing in the temperature range of 800-1100degreesC, the oxygen in S-CZ Si was hard to precipitate, even if the material contained higher carbon concentrations. After pre-annealing at 750degreesC, many more oxygen precipitates were formed, The amount and density of the oxygen precipitates were almost the same as in M-CZ Si annealed in single step. It is considered that oxygen has no significant influence on the efficiency of solar cells made from Cz silicon if it is annealed only by a single step in the range of 800-1100degreesC. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:133 / 138
页数:6
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