In-situ monitoring of heteroepitaxial growth processes using real-time spectroscopic ellipsometry and laser light scattering

被引：0
作者：
Pickering, C [1 ]
Carline, RT [1 ]
Hope, DAO [1 ]
Robbins, DJ [1 ]
机构：
[1] DEF RES AGCY,MALVERN WR14 3PS,WORCS,ENGLAND
来源：
SEMICONDUCTOR CHARACTERIZATION: PRESENT STATUS AND FUTURE NEEDS | 1996年
关键词：
D O I：
暂无
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
引用
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页码：532 / 536
页数：5
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