Superprism phenomena in photonic crystals: Toward microscale lightwave circuits
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Kosaka, H
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NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, JapanNEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
Kosaka, H
[1
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Kawashima, T
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机构:NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
Kawashima, T
Tomita, A
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机构:NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
Tomita, A
Notomi, M
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机构:NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
Notomi, M
Tamamura, T
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机构:NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
Tamamura, T
Sato, T
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机构:NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
Sato, T
Kawakami, S
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机构:NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
Kawakami, S
机构:
[1] NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
[2] Tohoku Univ, Elect Commun Res Inst, Sendai, Miyagi 98077, Japan
[3] NTT Corp, Optoelect Labs, Atsugi, Kanagawa 24301, Japan
The superprism phenomenon, the dispersion of light 500 times stronger than the dispersion in conventional prisms, was demonstrated at optical wavelengths in photonic crystals (PC's) fabricated on Si. Drastic light-beam steering in the PC's was achieved by slightly changing the incident wavelength or angle, The scanning span reached 50 degrees with only a 1% shift of incident wavelength, and reached 140 degrees with only a 14 degrees shift of the incident angle at wavelengths around 1 mu m The propagation direction was quantitatively interpreted in terms of highly anisotropic dispersion surfaces derived by photonic-band calculation. The physics behind this demonstration will open a novel field called photonic crystalline optics. The application of these phenomena promises to enable the fabrication of integrated microscale lightwave circuits (mu LC's) on Si with large scale integrated (LSI)-compatible lithography techniques. Such mu LC's will allow more efficient use of wavelength resources when used in wavelength multiplexers/demultiplexers or dispersion compensators by enabling lower loss and broader bandwidth.
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页码:2032 / 2038
页数:7
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[1]
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机构:
Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
Hanaizumi, O
Ohtera, Y
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Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
Ohtera, Y
Sato, T
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Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
Sato, T
Kawakami, S
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Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
机构:
Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
Hanaizumi, O
Ohtera, Y
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Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
Ohtera, Y
Sato, T
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Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
Sato, T
Kawakami, S
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Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, JapanTohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan