Investigation and modeling of plasma-wall interactions in inductively coupled fluorocarbon plasmas

被引:13
作者
Joseph, EA [1 ]
Zhou, B [1 ]
Sant, SP [1 ]
Overzet, LJ [1 ]
Goeckner, MJ [1 ]
机构
[1] Univ Texas, EE Dept, Richardson, TX 75080 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2004年 / 22卷 / 03期
关键词
D O I
10.1116/1.1722614
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Plasma-wall interactions in fluorocarbon based feedgas chemistries, namely CF4, are examined in a standard inductively coupled Gaseous Electronics Conference reference cell using in situ Fourier-transform infrared spectroscopy and microwave interferometry. Measurements show the dissociation of the CF4 feedgas into radical CF, species, as has been observed elsewhere [M. J. Goeckner and R. A. Breun, J. Vac. Sci. Technol. A 11, 3 (1993)], and qualitatively reveal a decrease in plasma-wall interactions as wall temperature is increased. Experimental results such as plasma density, loll cm(-3), and CF4 density 10(13) cm(-3), are further compared to results from the hybrid plasma equipment model [R. Kinder and M. J. Kushner, J. Vac. Sci. Teclulol. A 19, 76 (2001)] to better elucidate the influence of wall temperature on plasma exposed surfaces and sticking coefficients. Last, CF4 vibrational temperatures were also measured, revealing that the line-averaged vibrational temperature remains at a constant 40-60 K above the chamber wall temperature while the vibrational temperature in the center of the discharge is significantly higher. Moreover, the vibrational temperatures are further compared to results from a global thermal model and are in good agreement. (C) 2004 American Vacuum Society.
引用
收藏
页码:689 / 697
页数:9
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