60 keV Ar+-ion induced pattern formation on Si surface: Roles of sputter erosion and atomic redistribution

被引：17
作者：
Garg, S. K. [1 ]
Datta, D. P. [1 ]
Kumar, M. [1 ]
Kanjilal, D. [2 ]
Som, T. [1 ]
机构：
[1] Inst Phys, Bhubaneswar 751005, Orissa, India
[2] Interuniv Accelerator Ctr, New Delhi 110067, India
来源：
APPLIED SURFACE SCIENCE | 2014年 / 310卷
关键词：
Ion irradiation; Atomic force microscopy; Self-organized surface patterns; Parametric phase diagram; Curvature dependent sputter erosion and atomic redistribution; RIPPLE TOPOGRAPHY; BOMBARDMENT; SILICON; ENERGY; EVOLUTION; INSTABILITY; MORPHOLOGY; SCATTERING; SI(100); YIELDS;
D O I：
10.1016/j.apsusc.2014.03.115
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We study the evolution of surface morphology on Si(100) surface due to 60 keV Ar+-ion irradiation at room temperature for a wide range of ion fluences (2-80 x 10(17) ions cm(-2)) and angles of incidence (0 degrees-75 degrees). We have clearly distinguished linear and nonlinear regimes for the observed ripple patterns in our experiment. From our experimental results and those available in the literature, we have created a parametric phase diagram which summarizes an overview of pattern formation on silicon surface under medium energy ion irradiation. On the basis of this phase diagram, we demonstrate some striking similarities between medium and low energy ion-induced ripple patterns and infer that similar mechanisms may be responsible for pattern formation at both regimes. Comparison of our experimental results with numerical estimations reveals that both curvature dependent sputter erosion and ion induced atomic redistribution are responsible for the observed evolution of surface morphology. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码：147 / 153
页数：7
相关论文
共 42 条
[21]   Surface instability and pattern formation by ion-induced erosion and mass redistribution [J].
Hofsaess, Hans .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2014, 114 (02) :401-422
[22]   Magnetic anisotropy engineering: Single-crystalline Fe films on ion eroded ripple surfaces [J].
Liedke, M. O. ;
Koerner, M. ;
Lenz, K. ;
Grossmann, F. ;
Facsko, S. ;
Fassbender, J. .
APPLIED PHYSICS LETTERS, 2012, 100 (24)
[23]   Self-organized nanodot formation on MgO(100) by ion bombardment at high temperatures [J].
Lu, M ;
Yang, XJ ;
Perry, SS ;
Rabalais, JW .
APPLIED PHYSICS LETTERS, 2002, 80 (12) :2096-2098
[24]   Multiple scattering causes the low energy-low angle constant wavelength topographical instability of argon ion bombarded silicon surfaces [J].
Madi, Charbel S. ;
Aziz, Michael J. .
APPLIED SURFACE SCIENCE, 2012, 258 (09) :4112-4115
[25]   Mass Redistribution Causes the Structural Richness of Ion-Irradiated Surfaces [J].
Madi, Charbel S. ;
Anzenberg, Eitan ;
Ludwig, Karl F., Jr. ;
Aziz, Michael J. .
PHYSICAL REVIEW LETTERS, 2011, 106 (06)
[26]   Multiple Bifurcation Types and the Linear Dynamics of Ion Sputtered Surfaces [J].
Madi, Charbel S. ;
Davidovitch, Benny ;
George, H. Bola ;
Norris, Scott A. ;
Brenner, Michael P. ;
Aziz, Michael J. .
PHYSICAL REVIEW LETTERS, 2008, 101 (24)
[27]   Morphology of ion-sputtered surfaces [J].
Makeev, MA ;
Cuerno, R ;
Barabási, AL .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 197 (3-4) :185-227
[28]   Raman scattering from nanopatterned silicon surface prepared by low-energy Ar+-ion irradiation [J].
Mohanta, S. K. ;
Soni, R. K. ;
Tripathy, S. ;
Soh, C. B. ;
Chua, S. J. ;
Kanjilal, D. .
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2006, 35 (01) :42-47
[29]   Coupling of morphology to surface transport in ion-beam irradiated surfaces: Oblique incidence [J].
Munoz-Garcia, Javier ;
Cuerno, Rodolfo ;
Castro, Mario .
PHYSICAL REVIEW B, 2008, 78 (20)
[30]   Aligned silver nanoparticles on rippled silicon templates exhibiting anisotropic plasmon absorption [J].
Oates, Thomas W. H. ;
Keller, Adrian ;
Facsko, Stefan ;
Muecklich, Arndt .
PLASMONICS, 2007, 2 (02) :47-50
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