Ozone formation with (V)UV-enhanced dielectric barrier discharges in dry and humid gas mixtures of O2, N2/O2, and Ar/O2

被引:12
|
作者
Falkenstein, Z [1 ]
机构
[1] Univ Calif Los Alamos Natl Lab, Los Alamos, NM 87545 USA
关键词
ozone; (V)UV dielectric barrier discharge; singlet oxygen; photochemical decomposition; excimer; Joshi effect; humid gas mixtures; hydroxyl radical formation; oxygen; nitrogen; argon;
D O I
10.1080/01919512.1999.10382895
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
The effect of (V)UV illumination at 172 nm and 253.7 nm on ozone formation with dielectric barrier discharges in air-like mixtures of nitrogen/oxygen and argon/oxygen as function of the water concentration is presented. Although (V)UV at these wavelengths efficiently cleaves ozone, the ozone concentration in a combined (V)UV/dielectric barrier discharge in oxygen-containing gases is reduced only very little. This corresponds to an enhanced concentration of atomic singlet oxygen, which, in presence of water, increases the production of hydroxyl radicals. This is confirmed by measurements of the removal rates of 2-propanol and of its byproducts in dry and humid air in a combined (V)UV/dielectric barrier discharge treatment.
引用
收藏
页码:583 / 603
页数:21
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