Mask induced polarization

被引：22

作者：

Estroff, A ^{[1
]}

Fan, YF ^{[1
]}

Bourov, A ^{[1
]}

Cropanese, F ^{[1
]}

Lafferty, N ^{[1
]}

Zavyalova, L ^{[1
]}

Smith, B ^{[1
]}

机构：

[1] Rochester Inst Technol, Microelect Engn, Rochester, NY 14623 USA

来源：

OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3 | 2004年 / 5377卷

关键词：

photomask; polarization; immersion lithography; high NA; wire-grid polarizer;

D O I：

10.1117/12.546423

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The objective of this paper is to study the polarization induced by mask structures. Rigorous coupled-wave analysis (RCWA) was used to study the interaction of electromagnetic waves with mask features. RCWA allows the dependence of polarization effects of various wavelengths of radiation on grating pitch, profile, material, and thickness to be studied. The results show that for the five different mask materials examined, the material properties, mask pitch, and illumination all have a large influence on how the photomask polarizes radiation.

引用

页码：1069 / 1080

页数：12

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