Temperature-dependent strain rate sensitivity and activation volume of nanocrystalline Ni

被引:431
作者
Wang, Y. M.
Hamza, A. V.
Ma, E.
机构
[1] Lawrence Livermore Natl Lab, Chem & Mat Sci Directorate, Livermore, CA 94550 USA
[2] Johns Hopkins Univ, Dept Mat Sci & Engn, Baltimore, MD 21218 USA
关键词
nanocrystalline Ni; strain rate sensitivity; activation volume; activation energy; deformation mechanism;
D O I
10.1016/j.actamat.2006.02.013
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Repeated stress relaxation tests and strain rate jump tests have been carried out over a range of deformation temperatures (77-373 K) on electrodeposited nanocrystalline Ni with an average grain size of similar to 30 nm. The strain rate sensitivity, the apparent and physical activation volume, and the activation energy have been determined. The magnitude observed for these characteristic deformation parameters, as well as their temperature-dependent behavior, is very different from those of coarse-grained Ni. This suggests that the thermally activated process in nanocrystalline Ni is different from the conventional forest dislocation cutting mechanism. It is concluded that grain boundary diffusion-controlled processes such as Coble creep and grain boundary sliding can be ruled out as dominant mechanisms for the grain sizes and temperature range studied. Instead, our experimental findings and analysis suggest that the deformation kinetics are controlled by the activities of dislocations. The dominant thermally activated mechanism is suggested to originate from three possible processes, all involving interactions of mobile dislocations with grain boundaries. (c) 2006 Acta Materialia, Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:2715 / 2726
页数:12
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