ITO films realized at room-temperature by ion beam sputtering for high-performance flexible organic light-emitting diodes

被引：29
作者：
Lucas, B. [1 ]
Rammal, W. [1 ]
Moliton, A. [1 ]
机构：
[1] Univ Limoges, Fac Sci & Tech, CNRS,UMR 6172,Inst Rech XLIM, Dept MINACOM, F-87060 Limoges, France
来源：
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS | 2006年 / 34卷 / 03期
关键词：
D O I：
10.1051/epjap:2006056
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Indium-tin oxide (ITO) thin layers are obtained by an IBS (Ion Beam Sputtering) deposition process. We elaborated ITO films on flexible substrates of polyethylene terephthalate ( PET), under soft conditions of low temperatures and fulfilling the requirements of fabrication processes of the organic optoelectronic components. With a non thermally activated (20 degrees C) ITO deposition assisted by an oxygen flow ( (1 cm(3)/min), we got an optical transmittance of 90% in the visible range, a resistivity around 10(-3) Omega.cm and a surface roughness lower than 1.5 nm. Thus we realized flexible organic light-emitting diodes ( FOLEDs) with good performances: a maximum luminance of 12000 cd/m(2) at a voltage of 19 V and a maximum luminous power efficiency around 1 lm/W at a voltage of 10 V ( or a maximum current efficiency of 4 cd/A at 14 V) for the ( PET( 50 mu m)/ITO( 200 nm)/TPD( 40 nm)/Alq3( 60 nm)/ Ca/Al) structure.
引用
收藏
页码：179 / 187
页数：9
相关论文
共 26 条
[1]   Low-temperature growth of low-resistivity indium-tin-oxide thin films by pulsed laser deposition [J].
Adurodija, FO ;
Izumi, H ;
Ishihara, T ;
Yoshioka, H ;
Matsui, H ;
Motoyama, M .
VACUUM, 2000, 59 (2-3) :641-648
[2]   Structural, optical and electrical properties of indium tin oxide thin films prepared by spray pyrolysis [J].
Benamar, E ;
Rami, M ;
Messaoudi, C ;
Sayah, D ;
Ennaoui, A .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1999, 56 (02) :125-139
[3]  
BURROWS PE, 2000, P SPIE ANN M, V8, P1
[4]   Room temperature growth of indium tin oxide thin films by ultraviolet-assisted pulsed laser deposition [J].
Craciun, V ;
Craciun, D ;
Chen, Z ;
Hwang, J ;
Singh, RK .
APPLIED SURFACE SCIENCE, 2000, 168 (1-4) :118-122
[5]   Tin-doped indium oxide (ITO) film deposition by ion beam sputtering [J].
Han, Y ;
Kim, D ;
Cho, JS ;
Koh, SK ;
Song, YS .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2001, 65 (1-4) :211-218
[6]   Improved ITO thin films for photovoltaic applications with a thin ZnO layer by sputtering [J].
Herrero, J ;
Guillén, C .
THIN SOLID FILMS, 2004, 451 :630-633
[7]   Reactive magnetron sputtering of indium tin oxide films on acrylics - Electrical resistivity and optical properties [J].
Huang, JL ;
Jah, YT ;
Chen, CY ;
Yau, BS ;
Lin, SS .
JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE, 2000, 9 (04) :424-427
[8]  
JEONG SH, 2004, CURR APPL PHYS, V37, P847
[9]   CHEMICAL VAPOR-DEPOSITION OF TRANSPARENT ELECTRICALLY CONDUCTING LAYERS OF INDIUM OXIDE DOPED WITH TIN [J].
KANE, J ;
SCHWEIZER, HP ;
KERN, W .
THIN SOLID FILMS, 1975, 29 (01) :155-163
[10]   Low temperature deposition of ITO thin films by ion beam sputtering [J].
Kim, D ;
Han, Y ;
Cho, JS ;
Koh, SK .
THIN SOLID FILMS, 2000, 377 :81-86
123