UV/blue/green InGaN-based LEDs and laser diodes grown on epitaxially laterally overgrown GaN

被引:0
作者
Nakamura, S [1 ]
机构
[1] Nichia Chem Ind Ltd, Dept Res & Dev, Anan 7748601, Japan
关键词
InGaN; LED; laser diode; ELOG; sapphire;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
UV/blue/green InGaN and GaN single-quantum-well structure light-emitting diodes (LEDs) were grown on epitaxially laterally overgrown GaN (ELOG) and sapphire substrates. The external quantum efficiency (EQE) of the UV InGaN LED on ELOG was much higher than that on sapphire only at high-current operation. At low-current operation, both LEDs had the same EQE. When the active layer was GaN, EQE of the LED on sapphire was much lower than that on ELOG even at low- and high-current operations due to the lack of localized energy states formed by alloy composition fluctuations. In order to improve the lifetime of laser diode (LD), ELOG had to be used because the operating current density of the LD is much higher than that of LED. A violet InGaN multi-quantum-well/GaN/AlGaN separate-confinement-heterostructure LD was grown on ELOG on sapphire. The LDs with cleaved mirror facets showed an output power as high as 40 mW under room-temperature continuous-wave (CW) operation. The stable fundamental transverse mode was observed at an output power of up to 40 mW. The estimated lifetime of the LDs at a constant output power of 10mW was more than 2,000 hours under CW operation at an ambient temperature of 60 degrees C.
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页码:529 / 535
页数:7
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