Electrical characterization of nanocontacts fabricated by nanoindentation and electrodeposition

被引：14
作者：
Carrey, J
Bouzehouane, K
George, JM
Ceneray, C
Blon, T
Bibes, M
Vaurès, A
Fusil, S
Kenane, S
Vila, L
Piraux, L
机构：
[1] THALES, CNRS, Unite Mixte Phys, F-91405 Orsay, France
[2] Univ Evry, Lab Multicouches Nanometr, F-91025 Evry, France
[3] Univ Louvain La Neuve, Lab PCPM, B-1348 Louvain, Belgium
来源：
APPLIED PHYSICS LETTERS | 2002年 / 81卷 / 04期
关键词：
D O I：
10.1063/1.1495524
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We report on the electrical characterization of various types of nanocontacts fabricated by nanoindentation and electrodeposition. Arrays of holes with depths ranging from 0 to 20 nm were produced by nanoindenting at different strengths an Al2O3-50 Angstrom/NiFe-150 Angstrom//Si bilayer. NiFe was then electrodeposited, which led to the growth of particles in the holes. The resistance of the particles was measured with a conducting tip atomic force microscope. Depending on the strength used during the nanoindentation, the resistance ranges from less than 5x10(3) Omega to more than 10(12) Omega. The low-resistance constrictions can be used to study ballistic transport in materials. High-resistance contacts presumably correspond to tunnel nanojunctions. (C) 2002 American Institute of Physics.
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收藏
页码：760 / 762
页数：3
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