A new method for fabrication nano-porous aluminum grating array

被引：10

作者：

Li, Y ^{[1
]}

Kanamori, Y

Hane, K

机构：

[1] Shanghai Jiao Tong Univ, Inst Micro Nanometer Sci & Technol, Shanghai 200030, Peoples R China

[2] Tohoku Univ, Venture Business Lab, Sendai, Miyagi 980, Japan

来源：

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2004年 / 10卷 / 04期

关键词：

mask; anodic porous alumina; fast atom beam etching;

D O I：

10.1007/s00542-003-0303-1

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The fabrication technique of highly ordered anodic porous alumina membrane by anodization of Al and the obtained membrane as a mask to the fabrication of 100 nm period antireflection grating hole are described. The two-step anodizing process improves the quality of the nanohole because the periodic seeds are generated by the first anodization. Antireflection grating structures are fabricated by using ordered anodic porous alumina mask and etched by SF6 fast atom beam on silicon wafer. The reflectivity of the antireflection grating structures is measured and compared with that of the calculated value and the polished silicon surface.

引用

页码：272 / 274

页数：3

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