Vacuum UV Radiation of a Plasma Jet Operated With Rare Gases at Atmospheric Pressure

被引:27
作者
Lange, Hartmut [1 ]
Foest, Ruediger [1 ]
Schaefer, Jan [1 ]
Weltmann, Klaus-Dieter [1 ]
机构
[1] INP Greifswald eV, Leibniz Inst Plasma Sci & Technol, D-17489 Greifswald, Germany
关键词
Atmospheric pressure plasma jet (APPJ); microdischarges; vacuum ultraviolet (VUV) radiation; SURFACE-TREATMENT; VUV EMISSION; MICROPLASMAS; NEEDLE; MIXTURES;
D O I
10.1109/TPS.2009.2019982
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The vacuum ultraviolet (VUV) emissions from 115 to 200 nm from the effluent of an RF (1.2 MHz) capillary jet fed with pure argon and binary mixtures of argon and xenon or krypton (up to 20%) are analyzed. The feed gas mixture is emanating into air at normal pressure. The Ar(2)* excimer second continuum, observed in the region of 120-135 run, prevails in the pure Ar discharge. It decreases when small amounts (as low as 0.5%) of Xe or Kr are added. In that case, the resonant emission of Xe at 147 nm (or 124 nm for Kr, respectively) becomes dominant. The Xe(2)* second continuum at 172 nm appears for higher admixtures of Xe (10%). Furthermore, several N I emission lines, the O I resonance line, and H I line appear due to ambient air. Two absorption bands (120.6 and 124.6 nm) are present in the spectra. Their origin could be unequivocally associated to O(2) and O(3). The radiance is determined end-on at varying axial distance in absolute units for various mixtures of Ar/Xe and Ar/Kr and compared to pure Ar. Integration over the entire VUV wavelength region provides the integrated spectral distribution. Maximum values of 2.2 MW . mm(-2) . sr(-1) are attained in pure Ar and at a distance of 4 mm from the outlet nozzle of the discharge. By adding diminutive admixtures of Kr or Xe, the intensity and spectral distribution is effectively changed.
引用
收藏
页码:859 / 865
页数:7
相关论文
共 19 条
  • [1] Microplasmas and applications
    Becker, KH
    Schoenbach, KH
    Eden, JG
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (03) : R55 - R70
  • [2] Antimicrobial treatment of heat sensitive materials by means of atmospheric pressure rf-driven plasma jet
    Brandenburg, R.
    Ehlbeck, J.
    Stieber, M.
    von Woedtke, T.
    Zeymer, J.
    Schlueter, O.
    Weltmann, K. -D.
    [J]. CONTRIBUTIONS TO PLASMA PHYSICS, 2007, 47 (1-2) : 72 - 79
  • [3] PHOTOABSORPTION COEFFICIENT OF MOLECULAR-OXYGEN IN VICINITY OF HYDROGEN LYMAN-ALPHA LINE
    DOSE, V
    SCHMOCKER, U
    SELE, G
    [J]. ZEITSCHRIFT FUR PHYSIK A-HADRONS AND NUCLEI, 1975, 274 (01): : 1 - 8
  • [4] RF capillary jet - a tool for localized surface treatment
    Foest, R.
    Kindel, E.
    Lange, H.
    Ohl, A.
    Stieber, M.
    Weltmann, K. -D.
    [J]. CONTRIBUTIONS TO PLASMA PHYSICS, 2007, 47 (1-2) : 119 - 128
  • [5] Non-thermal atmospheric pressure discharges for surface modification
    Foest, R
    Kindel, E
    Ohl, A
    Stieber, M
    Weltmann, KD
    [J]. PLASMA PHYSICS AND CONTROLLED FUSION, 2005, 47 : B525 - B536
  • [6] Microplasmas, an emerging field of low-temperature plasma science and technology
    Foest, R
    Schmidt, M
    Becker, K
    [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 2006, 248 (03) : 87 - 102
  • [7] On the Vacuum Ultraviolet Radiation of a Miniaturized Non-thermal Atmospheric Pressure Plasma Jet
    Foest, Ruediger
    Bindemann, Thomas
    Brandenburg, Ronny
    Kindel, Eckhard
    Lange, Hartmut
    Stieber, Manfred
    Weltmann, Klaus-Dieter
    [J]. PLASMA PROCESSES AND POLYMERS, 2007, 4 : S460 - S464
  • [8] Gas flow dependence for plasma-needle disinfection of S-mutans bacteria
    Goree, J.
    Liu, Bin
    Drake, David
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (16) : 3479 - 3486
  • [9] Channels of energy transfer to atomic nitrogen in excited argon-nitrogen mixtures
    Krylov, B
    Morozov, A
    Gerasimov, G
    Arnesen, A
    Hallin, R
    Heijkenskjöld, F
    [J]. JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 2002, 35 (20) : 4257 - 4270
  • [10] Lange H, 2008, ACTA TECH CSAV, V53, P323