Imprinted Electrodes for Enhanced Light Trapping in Solution Processed Solar Cells

被引：40

作者：

Mihi, Agustin ^{[1
]}

Beck, Fiona J. ^{[1
]}

Lasanta, Tania ^{[1
]}

Rath, Arup K. ^{[1
]}

Konstantatos, Gerasimos ^{[1
]}

机构：

[1] ICFO Inst Ciencies Foton, Barcelona 08860, Spain

来源：

ADVANCED MATERIALS | 2014年 / 26卷 / 03期

关键词：

soft imprint lithography; light trapping; solution processed; solar cells; NANOIMPRINT LITHOGRAPHY; ABSORPTION ENHANCEMENT; PHOTONIC CRYSTALS; NANOSTRUCTURES; PHOTOVOLTAICS; DESIGN; LIMIT; PATH;

D O I：

10.1002/adma.201303674

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A simple approach is demonstrated to combine a light trapping scheme and a conductive substrate for solution processed solar cells. By means of soft lithography, a new light-trapping architecture can be integrated as the bottom electrode for emerging thin-film solar-cell technologies without added costs, fully compatible with low-temperature processes, and yielding an enhancement in the photocurrent without altering the rest of the electrical performance of the device. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：443 / 448

页数：6

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