Influence of size effect and sputtering conditions on the crystallinity and optical properties of ZnO thin films

被引:66
作者
Kapustianyk, V.
Turko, B.
Kostruba, A.
Sofiani, Z.
Derkowska, B.
Dabos-Seignon, S.
Barwinski, B.
Eliyashevskyi, Yu.
Sahraoui, B.
机构
[1] Inst Phys Opt, UA-79005 Lvov, Ukraine
[2] Lviv Acad Commerce, UA-79005 Lvov, Ukraine
[3] Ivan Franko Natl Univ Lviv, Sci Tech & Educat Ctr Low Temp Studies, UA-79005 Lvov, Ukraine
[4] Univ Angers, UMR CNRS 6136, Lab POMA, F-49045 Angers, France
[5] Univ Wroclaw, Inst Phys Expt, PL-50204 Wroclaw, Poland
关键词
ZnO thin films; refractive index; cathodoluminescence;
D O I
10.1016/j.optcom.2006.08.034
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The effects of the thickness variation, substrate type and annealing on the crystallinity parameters, luminescent and optical properties of the zinc oxide (ZnO) thin films were reported. The thin films were deposited on the glass and the amorphous quartz substrates by the standard RF-magnetron sputtering method using ZnO targets in the argon atmosphere. It has been found that the films deposited on the glass substrate manifest a clear size effect. Both the structural and the optical parameters show clearly minima on their thickness dependences. It has been shown that annealing of the comparatively thick ZnO films leads to increase of the crystallite sizes that are followed by a considerable rise of the cathodoluminescence intensity. The corresponding model of the crystallite growth is proposed. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:346 / 350
页数:5
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