Plasma-nitriding of tantalum at relatively low temperature

被引：0
|
作者：
Zhang, DY [1 ]
Lin, Q
Zhao, HM
Fei, QY
Geng, M
机构：
[1] Natl R&D Ctr Surface Engn China, Shenzhen 518029, Peoples R China
[2] Univ Sci & Technol Beijing, Beijing 100083, Peoples R China
来源：
RARE METALS | 2004年 / 23卷 / 02期
关键词：
surface and interface of materials; plasma nitriding; orthogonal regression method; tantalum;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The combined quadratic orthogonal regression method of experiment design was employed to explore the effects of process parameters of plasma nitriding of tantalum such as total pressure, temperature and original hydrogen molar fraction on the hardness, roughness and structure of nitriding surfaces. The regression equations of hardness, roughness and structure were given according to the results of regression and statistic analysis. And the diffusion activation energy of nitrogen in tantalum on plasma nitriding conditions was calculated according to the experimental data of hardness of plasma-nitriding of tantalum vs time and temperature. The diffusion activation energy calculated belongs to (155.49 +/- 10.51) kJ/mol (783-983 K).
引用
收藏
页码：185 / 188
页数：4
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