Analysis of the x-ray photoelectron spectrum of Teflon AF 1600

被引：20
|
作者：
Sacher, E [1 ]
KlembergSapieha, JE [1 ]
机构：
[1] ECOLE POLYTECH,COUCHES MINCES GRP,MONTREAL,PQ H3C 3A7,CANADA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1997年 / 15卷 / 04期
关键词：
D O I：
10.1116/1.580620
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The C Is, F Is, and O Is components of the x-ray photoelectron spectroscopy spectrum of Teflon AF 1600 have been obtained and their constituent peaks were separated and attributed. The effect of an intervening carbon atom on the F Is spectrum has been shown to decrease the inductive effect of a next-nearest neighbor fragment. An unexpected chemical shift in the O Is spectrum has been traced to nonbonded steric interactions of close lying rings. (C) 1997 American Vacuum Society.
引用
收藏
页码：2143 / 2147
页数：5
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