Nanoscale superconductor-normal metal-superconductor junctions fabricated by focused ion beam

被引：4

作者：

Burnell, G ^{[1
]}

Hadfield, RH ^{[1
]}

Bell, C ^{[1
]}

Kang, DJ ^{[1
]}

Blamire, MG ^{[1
]}

机构：

[1] Univ Cambridge, Dept Mat Sci & IRC Supercond, Device Mat Grp, Cambridge CB2 3QZ, England

来源：

PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 2002年 / 372卷

关键词：

superconducting junctions; voltage standards; magnesium diboride;

D O I：

10.1016/S0921-4534(02)00691-3

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have developed a reliable and versatile technique for fabricating low T-C superconductor-normal metal-superconductor Josephson junctions with a focused ion beam (FIB) microscope in conjunction with an in situ resistance measurement technique. This provides a simple method that allow us to create a variety of single and multi-junction superconducting devices (arrays, SQUIDs and 3 terminal devices) with desirable and well-controlled properties and high integration densities. Here we discuss the development of this technique, demonstrating the versatility of the FIB in this application with recent results from arrays intended for voltage standards, devices with novel circular junction geometry, and devices fabricated in MgB2. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：14 / 17

页数：4

共 6 条

[1] Planar superconductor-normal-superconductor Josephson junctions in MgB2 [J].

Burnell, G ;

Kang, DJ ;

Lee, HN ;

Moon, SH ;

Oh, B ;

Blamire, MG .

APPLIED PHYSICS LETTERS, 2001, 79 (21) :3464-3466

[2]

HADFIELD RH, 2001, P ISEC 2001 JAP

[3] Real time resistometric depth monitoring in the focused ion beam [J].

Latif, A ;

Booij, WE ;

Durrell, JH ;

Blamire, MG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (02) :761-764

[4] High critical current densities in superconducting MgB2 thin films [J].

Moon, SH ;

Yun, JH ;

Lee, HN ;

Kye, JI ;

Kim, HG ;

Chung, W ;

Oh, B .

APPLIED PHYSICS LETTERS, 2001, 79 (15) :2429-2431

[5] Direct writing of low Tc superconductor-normal metal-superconductor junctions using a focused ion beam [J].

Moseley, RW ;

Booij, WE ;

Tarte, EJ ;

Blamire, MG .

APPLIED PHYSICS LETTERS, 1999, 75 (02) :262-264

[6] Effects of a 20 K operation on the bit-error rates of a prospective MgB2 based digital circuit [J].

Ortlepp, T ;

Toepfer, H ;

Uhlmann, HF .

SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 2001, 14 (08) :L37-L39

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