High-voltage transition studies from rectification to resistive switching in Ag/PVDF/Au capacitor-like structures

被引:11
作者
Pramod, Kadukatty [1 ]
Gangineni, R. B. [1 ]
机构
[1] Pondicherry Univ, Dept Phys, Sch Phys Chem & Appl Sci, Kalapet 605014, Puducherry, India
关键词
PVDF thin film; RRAM; Non-volatile memory; Rectification; Resistive switching; POLY(VINYLIDENE FLUORIDE); NONVOLATILE MEMORY; PHASE; FILMS; FABRICATION;
D O I
10.1007/s00289-017-2178-9
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
This work reports the transition from rectifying type to resistive switching in semicrystalline, unpoled intrinsic form of polyvinylidene fluoride (PVDF) thin films in Ag/PVDF/Au capacitor-like structures. The transition is noted after the breakdown of Schottky barrier at electric fields of 3 MV/cm along with the changeover from asymmetric to symmetric I-V curves. The sharp change from asymmetric to symmetric I-V loops further revealed bipolar-resistive switching. The asymmetric and symmetric I-V transport mechanisms are evaluated with the Fowler-Nordheim tunneling and space-charge-limited current mechanisms at high voltages. Furthermore, the resistive-switching phenomena are attributed to the filament formation from the ohmic response of the low-resistance state.
引用
收藏
页码:2769 / 2778
页数:10
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