Selected Area Electron Beam Induced Deposition of Pt and W for EBSD Backgrounds

被引：0

作者：

Osborn, William A. ^{[1
]}

McLean, Mark J. ^{[1
]}

Bush, Brian ^{[1
]}

机构：

[1] NIST, Mat Measurement Sci Div, 100 Bur Dr,MS 8520, Gaithersburg, MD 20899 USA

来源：

MICROSCOPY AND MICROANALYSIS | 2019年 / 25卷 / 01期

关键词：

background; band contrast; EBSD; EBID; HR-EBSD;

D O I：

10.1017/S1431927618016173

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Applying high-resolution electron backscatter diffraction (HR-EBSD) to materials without regions that are amenable to the acquisition of backgrounds for static flat fielding (background subtraction) can cause analysis problems. To address this difficulty, the efficacy of electron beam induced deposition (EBID) of material as a source for an amorphous background signal is assessed and found to be practical. Using EBID material for EBSD backgrounds allows single crystal and large-grained samples to be analyzed using HR-EBSD for strain and small angle rotation measurement.

引用

页码：77 / 79

页数：3

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