Layout optimization on low-voltage-triggered PNP devices for ESD protection in mixed-voltage I/O interfaces

被引:4
作者
Chang, WJ [1 ]
Ker, MD [1 ]
机构
[1] Natl Chiao Tung Univ, Inst Elect, Nanoelect & Gigascale Syst Lab, Hsinchu 30039, Taiwan
来源
IPFA 2004: PROCEEDINGS OF THE 11TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS | 2004年
关键词
D O I
10.1109/IPFA.2004.1345599
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Layout optimization on low-voltage-triggered PNP (LVTPNP) devices for ESD protection in mixed-voltage I/O interfaces is proposed in this paper. The experimental results in both 0.35-mum and 0.25-mum CMOS processes have proven that the ESD levels of the LVTPNP drawn in the multi-finger layout style are higher than that drawn in the original layout style. Moreover, the LVTPNP device in multi-finger layout style has been implemented in a 0.25-mum salicided CMOS process to protect successfully the input stage of an ADSL IC with power-rail ESD clamp circuit.
引用
收藏
页码:213 / 216
页数:4
相关论文
共 5 条
[1]  
Dabral S., 1998, BASIC ESD IO DESIGN
[2]  
*ESD ASS, 2001, 51 ESD ASS STM
[3]  
Ker MD, 2004, ISQED 2004: 5TH INTERNATIONAL SYMPOSIUM ON QUALITY ELECTRONIC DESIGN, PROCEEDINGS, P433
[4]   The effect of silicide on ESD performance [J].
Notermans, G ;
Heringa, A ;
van Dort, M ;
Jansen, S ;
Kuper, F .
1999 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 37TH ANNUAL, 1999, :154-158
[5]  
Voldman S., 1994, P EOS ESD S, P125