Analysis of Hollow Cathode Aperture Wall Profile on Pseudospark Discharge-Based Sheet Electron Beam Source

被引:11
作者
Singhal, Kushagra [1 ]
Gurjar, Nikita [1 ]
Jain, Sahil [1 ]
Vishant [1 ]
Abhishek, Anand [2 ]
Starodubov, A. V. [3 ,4 ]
Ryskin, N. M. [4 ,5 ]
Kumar, Niraj [1 ]
机构
[1] CSIR, Cent Elect Engn Res Inst CEERI, Vacuum Electron Devices Design Grp, Pilani 333031, Rajasthan, India
[2] CSIR, Cent Elect Engn Res Inst CEERI, Societal Elect Grp, Pilani 333031, Rajasthan, India
[3] Saratov NG Chernyshevskii State Univ, Educ & Res Inst Nanostruct & Biosyst, Saratov 410012, Russia
[4] Russian Acad Sci RAS, Kotelnikov Inst Radio Engn & Elect, Saratov Branch, Saratov 410019, Russia
[5] Saratov NG Chernyshevskii State Univ, Fac Nonlinear Proc, Saratov 410012, Russia
基金
俄罗斯基础研究基金会;
关键词
Aperture wall profile; hollow cathode; pseudospark (PS) discharge; sheet electron beam; SIMULATION;
D O I
10.1109/TPS.2020.3040593
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
In this article, an investigation has been performed to analyze the role of hollow cathode aperture wall profile on pseudospark (PS) discharge-based single gap sheet electron beam source. A simulation study using COMSOL Multiphysics has been carried out for different hollow cathode aperture wall profile parameters, such as thickness and radius of curvature of aperture wall. The role of hollow cathode aperture wall thickness "t" and the radius of curvature of aperture wall "R" for different gas pressures, 16-20 Pa, and the corresponding applied gap voltage 16-20 kV have been studied. The hollow cathode aperture wall thickness has been analyzed for the range of similar to 1-3 mm, keeping the constant aspect ratio 12:1, while the radius of curvature of aperture wall has been analyzed for the range of 0-3 mm for different wall thicknesses. Experimental studies have also been performed to analyze the role of the thickness of the aperture wall on PS discharge. A good correlation has been obtained between the simulation and experimental studies.
引用
收藏
页码:302 / 306
页数:5
相关论文
共 24 条
  • [1] PSEUDOSPARK DISCHARGES VIA COMPUTER-SIMULATION
    BOEUF, JP
    PITCHFORD, LC
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) : 286 - 296
  • [2] STABILITY AND CONFINEMENT OF NONRELATIVISTIC SHEET ELECTRON-BEAMS WITH PERIODIC CUSPED MAGNETIC FOCUSING
    BOOSKE, JH
    MCVEY, BD
    ANTONSEN, TM
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 73 (09) : 4140 - 4155
  • [3] CHRISTIANSEN J, 1990, NATO ADV SCI I B-PHY, V219, P1
  • [4] Generation and application of pseudospark-sourced electron beams
    Cross, A. W.
    Yin, H.
    He, W.
    Ronald, K.
    Phelps, A. D. R.
    Pitchford, L. C.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (07) : 1953 - 1956
  • [5] THE FUNDAMENTALS OF THE PSEUDOSPARK AND ITS APPLICATIONS
    FRANK, K
    CHRISTIANSEN, J
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1989, 17 (05) : 748 - 753
  • [6] Design Approach for a Miniaturized Pseudospark-Based High-Current-Density Sheet Electron Beam Source
    Gurjar, Nikita
    Hossain, Afaque M.
    Singh, Rishu
    Sharma, R. K.
    Anitha, V. P.
    Singh, Raj
    Kumar, Niraj
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (10) : 4398 - 4402
  • [7] Generation of broadband terahertz radiation using a backward wave oscillator and pseudospark-sourced electron beam
    He, W.
    Zhang, L.
    Bowes, D.
    Yin, H.
    Ronald, K.
    Phelps, A. D. R.
    Cross, A. W.
    [J]. APPLIED PHYSICS LETTERS, 2015, 107 (13)
  • [8] Howatson M., 1976, INTRO GAS DISCHARGE, V2nd
  • [9] A tapered multi-gap multi-aperture pseudospark-sourced electron gun based X-band slow wave oscillator
    Kumar, N.
    Lamba, R. P.
    Hossain, A. M.
    Pal, U. N.
    Phelps, A. D. R.
    Prakash, R.
    [J]. APPLIED PHYSICS LETTERS, 2017, 111 (21)
  • [10] Effect of Tapered Interelectrode Gap Region on Pseudospark-Sourced Electron Beam Emission
    Kumar, Niraj
    Lamba, Ram Prakash
    Hossain, Afaque M.
    Abhishek, Anand
    Prakash, Ram
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2020, 67 (03) : 1211 - 1214