Differential Methylation Analysis of Suicidal Ideation Severity in Schizophrenia with the Illumina MethylationEPIC Array

被引:1
作者
Wang, Kevin Z. [1 ]
Chaudhary, Zanib [1 ]
Qian, Jessica [1 ]
Adanty, Christopher [1 ]
Graff-Guerrero, Ariel [1 ]
Gerretsen, Philip [1 ]
Zai, Clement C. [1 ]
De Luca, Vincenzo [1 ]
机构
[1] Univ Toronto, Dept Psychiat, Toronto, ON M5T 1R8, Canada
关键词
DNA methylation; schizophrenia; suicide; Illumina EPIC; C-SSRS; EPIGENOME-WIDE ASSOCIATION; GLUCOCORTICOID-RECEPTOR; DNA METHYLATION; RISK;
D O I
10.3390/healthcare10050809
中图分类号
R19 [保健组织与事业(卫生事业管理)];
学科分类号
摘要
There is a multitude of factors that makes difficult to identify those at risk for suicide, especially among schizophrenia patients. Suicide cannot be explained by genetics alone, therefore epigenetic mechanisms including DNA methylation are thought to play a role. DNA methylation could be a valuable tool in helping predict those at-risk individuals. This cross-sectional study comprised 112 subjects diagnosed with schizophrenia spectrum disorders, and were grouped according to the current suicidal ideation severity. DNA methylation across the genome was measured with the Infinium (R) MethylationEPIC BeadChip. We utilized the dmpFinder and bumphunter functions within the Bioconductor minfi package to identify differentially methylated positions (DMPs) and differentially methylated regions (DMRs), respectively. Following quality control, we removed one sample from the analysis and reported the most significant DMPs and DMRs associated with suicidal ideation severity. All positions and regions identified in this analysis were only found to have suggestive levels of significance at the genome-wide level. The present study was one of the first to investigate genome-wide methylation and suicidal ideation severity. While there were many strengths of our study, including investigating both differentially methylated positions and regions, further larger-scale studies are necessary to replicate, support, and validate our findings presented here.
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页数:9
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