Effect of Si+ ion irradiation of α-Ga2O3 epitaxial layers on their hydrogen sensitivity

被引:2
作者
Yakovlev, N. N. [1 ]
Almaev, A. V. [1 ,2 ]
Butenko, P. N. [1 ,3 ]
Mikhaylov, A. N. [4 ]
Pechnikov, A. I. [3 ]
Stepanov, S. I. [3 ]
Timashov, R. B. [3 ]
Chikiryaka, A. V. [3 ]
Nikolaev, V. I. [3 ,5 ]
机构
[1] Tomsk State Univ, Tomsk, Russia
[2] Fokon LLC, Kaluga, Russia
[3] Ioffe Inst, St Petersburg, Russia
[4] Lobachevsky State Univ, Nizhnii Novgorod, Russia
[5] Perfect Crystals LLC, St Petersburg, Russia
来源
MATERIALS PHYSICS AND MECHANICS | 2022年 / 48卷 / 03期
基金
俄罗斯科学基金会;
关键词
alpha-Ga2O3; halide vapor phase epitaxy; ion implantation; gas sensitivity; BEHAVIOR;
D O I
10.18149/MPM.4832022_1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effect of Si+ ion irradiation of alpha-Ga2O3 at doses of 8 center dot 10(12) cm(-2), 8 center dot 10(14) cm(-2), and energy of 100 keV on the gas-sensitive properties has been studied. It is shown that irradiation of alpha-Ga2O3 layer grown by halide vapor phase epitaxy with implanted Si+ ions allows effective control of its sensitivity to H-2, response, and recovery times, as well as varying the operating temperatures. The maximum sensitivity to H-2 occurred for samples with Si+ ion irradiation dose of 8 center dot 10(12) cm(-2) at 400 degrees C. The mechanism of sensitivity of alpha-(GaO3)-O-2 epitaxial layers irradiated with Si+ to H-2 is discussed.
引用
收藏
页码:301 / 307
页数:7
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