共 18 条
Effect of Si+ ion irradiation of α-Ga2O3 epitaxial layers on their hydrogen sensitivity
被引:2
作者:

Yakovlev, N. N.
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机构:
Tomsk State Univ, Tomsk, Russia Tomsk State Univ, Tomsk, Russia

Almaev, A. V.
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h-index: 0
机构:
Tomsk State Univ, Tomsk, Russia
Fokon LLC, Kaluga, Russia Tomsk State Univ, Tomsk, Russia

Butenko, P. N.
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机构:
Tomsk State Univ, Tomsk, Russia
Ioffe Inst, St Petersburg, Russia Tomsk State Univ, Tomsk, Russia

Mikhaylov, A. N.
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机构:
Lobachevsky State Univ, Nizhnii Novgorod, Russia Tomsk State Univ, Tomsk, Russia

Pechnikov, A. I.
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h-index: 0
机构:
Ioffe Inst, St Petersburg, Russia Tomsk State Univ, Tomsk, Russia

Stepanov, S. I.
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h-index: 0
机构:
Ioffe Inst, St Petersburg, Russia Tomsk State Univ, Tomsk, Russia

Timashov, R. B.
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h-index: 0
机构:
Ioffe Inst, St Petersburg, Russia Tomsk State Univ, Tomsk, Russia

Chikiryaka, A. V.
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h-index: 0
机构:
Ioffe Inst, St Petersburg, Russia Tomsk State Univ, Tomsk, Russia

Nikolaev, V. I.
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h-index: 0
机构:
Ioffe Inst, St Petersburg, Russia
Perfect Crystals LLC, St Petersburg, Russia Tomsk State Univ, Tomsk, Russia
机构:
[1] Tomsk State Univ, Tomsk, Russia
[2] Fokon LLC, Kaluga, Russia
[3] Ioffe Inst, St Petersburg, Russia
[4] Lobachevsky State Univ, Nizhnii Novgorod, Russia
[5] Perfect Crystals LLC, St Petersburg, Russia
来源:
MATERIALS PHYSICS AND MECHANICS
|
2022年
/
48卷
/
03期
基金:
俄罗斯科学基金会;
关键词:
alpha-Ga2O3;
halide vapor phase epitaxy;
ion implantation;
gas sensitivity;
BEHAVIOR;
D O I:
10.18149/MPM.4832022_1
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
The effect of Si+ ion irradiation of alpha-Ga2O3 at doses of 8 center dot 10(12) cm(-2), 8 center dot 10(14) cm(-2), and energy of 100 keV on the gas-sensitive properties has been studied. It is shown that irradiation of alpha-Ga2O3 layer grown by halide vapor phase epitaxy with implanted Si+ ions allows effective control of its sensitivity to H-2, response, and recovery times, as well as varying the operating temperatures. The maximum sensitivity to H-2 occurred for samples with Si+ ion irradiation dose of 8 center dot 10(12) cm(-2) at 400 degrees C. The mechanism of sensitivity of alpha-(GaO3)-O-2 epitaxial layers irradiated with Si+ to H-2 is discussed.
引用
收藏
页码:301 / 307
页数:7
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