Spin polarization of Co2MnGe and Co2MnSi thin films with A2 and L21 structures

被引:27
|
作者
Rajanikanth, A. [1 ]
Takahashi, Y. K.
Hono, K.
机构
[1] Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3050047, Japan
[2] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
关键词
D O I
10.1063/1.2409775
中图分类号
O59 [应用物理学];
学科分类号
摘要
Spin polarizations (P) of polycrystalline Co2MnGe and Co2MnSi films that were sputter deposited on thermally oxidized Si substrates at various substrate temperatures (T-s) were measured by the point contact Andreev reflection technique. While continuous films were grown at T-s = 500 degrees C with the L2(1) structure, Mn-deficit islands were formed at T-s > 700 degrees C. P showed strong dependence on the state of order of the alloys; P = 0.58 for L2(1) ordered Co2MnGe, P = 0.35 for A2 Co2MnGe, P = 0.54 for L2(1) ordered Co2MnSi, and P = 0.52 for A2 Co2MnSi. The experimentally determined P values of the L2(1) ordered films are lower than the theoretical predictions, which is attributed to the imperfect L2(1) ordering. (c) 2007 American Institute of Physics.
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页数:5
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