Thickness dependence of transformation characteristics of Ni-Mn-Ga thin films deposited on alumina: Experiment and modeling

被引：22
作者：
Chernenko, V. A.
Kohl, M.
Ohtsuka, M.
Takagi, T.
L'vov, V. A.
Kniazkyi, V. M.
机构：
[1] Inst Magnetism, UA-03142 Kiev, Ukraine
[2] Forschungszentrum Karlsruhe, IMT, D-76021 Karlsruhe, Germany
[3] Tohoku Univ, IMRAM, Sendai, Miyagi 9808577, Japan
[4] Tohoku Univ, IFS, Sendai, Miyagi 9808577, Japan
[5] Taras Shevchenko Univ, Radiophys Dept, UA-03127 Kiev, Ukraine
来源：
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2006年 / 438卷 / 944-947期
关键词：
Ni-Mn-Ga thin films; alumina substrate; martensitic transformation temperatures; resistivity; modeling;
D O I：
10.1016/j.msea.2006.02.055
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A thickness dependence of the martensitic transformation temperature is experimentally found in submicrometer Ni-Mn-Ga films deposited and annealed on alumina substrate. A theoretical description of the stress state of these films originating from the particular martensitic microstructure and elastic interaction between film and substrate is developed. Experimental results are in a satisfactory agreement with the theoretical estimations. (c) 2006 Elsevier B.V. All rights reserved.
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收藏
页码：944 / 947
页数：4
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