Projection phase contrast microscopy with a hard x-ray nanofocused beam: Defocus and contrast transfer

被引：14

作者：

Salditt, T. ^{[1
]}

Giewekemeyer, K. ^{[1
]}

Fuhse, C. ^{[1
]}

Krueger, S. P. ^{[1
]}

Tucoulou, R. ^{[2
]}

Cloetens, P. ^{[2
]}

机构：

[1] Univ Gottingen, Inst Rontgenphys, D-37077 Gottingen, Germany

[2] ESRF, F-38043 Grenoble, France

来源：

PHYSICAL REVIEW B | 2009年 / 79卷 / 18期

关键词：

holography; lithography; mirrors; nanotechnology; undulator radiation; X-ray microscopy; RESOLUTION;

D O I：

10.1103/PhysRevB.79.184112

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report a projection phase contrast microscopy experiment using hard x-ray pink beam undulator radiation focused by an adaptive mirror system to 100-200 nm spot size. This source is used to illuminate a lithographic test pattern with a well-controlled range of spatial frequencies. The oscillatory nature of the contrast transfer function with source-to-sample distance in this holographic imaging scheme is quantified and the validity of the weak phase object approximation is confirmed for the experimental conditions.

引用

页数：6

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