Projection phase contrast microscopy with a hard x-ray nanofocused beam: Defocus and contrast transfer

被引：14
|
作者：
Salditt, T. [1 ]
Giewekemeyer, K. [1 ]
Fuhse, C. [1 ]
Krueger, S. P. [1 ]
Tucoulou, R. [2 ]
Cloetens, P. [2 ]
机构：
[1] Univ Gottingen, Inst Rontgenphys, D-37077 Gottingen, Germany
[2] ESRF, F-38043 Grenoble, France
来源：
PHYSICAL REVIEW B | 2009年 / 79卷 / 18期
关键词：
holography; lithography; mirrors; nanotechnology; undulator radiation; X-ray microscopy; RESOLUTION;
D O I：
10.1103/PhysRevB.79.184112
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We report a projection phase contrast microscopy experiment using hard x-ray pink beam undulator radiation focused by an adaptive mirror system to 100-200 nm spot size. This source is used to illuminate a lithographic test pattern with a well-controlled range of spatial frequencies. The oscillatory nature of the contrast transfer function with source-to-sample distance in this holographic imaging scheme is quantified and the validity of the weak phase object approximation is confirmed for the experimental conditions.
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收藏
页数：6
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