Chemical vapor deposition of low reflective cobalt (II) oxide films

被引:14
作者
Amin-Chalhoub, Eliane [1 ]
Duguet, Thomas [1 ]
Samelor, Diane [1 ]
Debieu, Olivier [1 ]
Ungureanu, Elisabeta [1 ]
Vahlas, Constantin [1 ]
机构
[1] CNRS Univ Toulouse, CIRIMAT, F-31030 Toulouse 4, France
关键词
Optical reflectivity; MOCVD; Refractive index gradient; CoO; Cobalt oxide; THIN-FILMS; OPTICAL-PROPERTIES; BLACK COBALT; COATINGS; CO; GROWTH; LAYER; MICROSTRUCTURE; TEMPERATURE; PARAMETERS;
D O I
10.1016/j.apsusc.2015.10.188
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Low reflective CoO coatings are processed by chemical vapor deposition from Co-2(CO)(8) at temperatures between 120 degrees C and 190 degrees C without additional oxygen source. The optical reflectivity in the visible and near infrared regions stems from 2 to 35% depending on deposition temperature. The combination of specific microstructural features of the coatings, namely a fractal "cauliflower" morphology and a grain size distribution more or less covering the near UV and IR wavelength ranges enhance light scattering and gives rise to a low reflectivity. In addition, the columnar morphology results in a density gradient in the vertical direction that we interpret as a refractive index gradient lowering reflectivity further down. The coating formed at 180 degrees C shows the lowest average reflectivity (2.9%), and presents an interesting deep black diffuse aspect. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:540 / 546
页数:7
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