High temperature tin-copper joints produced at low process temperature for stress reduction

被引:25
作者
Lee, CC
Chen, YC
机构
[1] Electrical and Computer Engineering, University of California, Irvine, CA 92717
关键词
alloys; copper; tin; deposition process;
D O I
10.1016/S0040-6090(95)08502-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A fluxless bonding technique using Sn-Cu multilayer composites to produce high temperature joints at relatively low temperature is presented. At a 280 degrees C process temperature, joints which were almost void-free, with a melting point of 415 degrees C, were made. With a further annealing step, re-melting temperature of the joints increases to 713 degrees C. The technique, thus, gives a quantum jump to the post-processing temperature of the components fabricated. As a result of decreased bonding temperature, stresses in the fabricated components are greatly reduced. SEM results clearly show the microstructures of the joints that consist of Cu6Sn5 and Cu3Sn intermetallic phases, thereby verifying the proposed bonding principle. No flux is required because tin oxidation is inhibited in the fabrication processes.
引用
收藏
页码:213 / 218
页数:6
相关论文
共 19 条
[1]   A STUDY OF INTERMETALLIC COMPOUND FORMATION IN A COPPER-TIN BIMETALLIC COUPLE [J].
BANDYOPADHYAY, AK ;
SEN, SK .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (08) :3681-3688
[2]  
BERSTEIN L, 1966, J ELECTROCHEMICAL SO, V113, P1282
[3]  
CHAN CJ, 1992, MATER RES SOC SYMP P, V264, P311, DOI 10.1557/PROC-264-311
[4]   LOW-TEMPERATURE COMPOUND FORMATION IN CU/SN THIN-FILM COUPLES [J].
CHOPRA, R ;
OHRING, M ;
OSWALD, RS .
THIN SOLID FILMS, 1982, 94 (04) :279-288
[5]   INTERSTITIAL DIFFUSION OF COPPER IN TIN [J].
DYSON, BF ;
ANTHONY, TR ;
TURNBULL, D .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (08) :3408-&
[6]   THERMAL AND ELECTRICAL-PROPERTIES OF COPPER-TIN AND NICKEL-TIN INTERMETALLICS [J].
FREDERIKSE, HPR ;
FIELDS, RJ ;
FELDMAN, A .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (07) :2879-2882
[7]   INTERFACIAL REACTION IN BIMETALLIC SN-CU THIN-FILMS [J].
FUJIWARA, K ;
OHTANI, M ;
ISU, T ;
NANGO, S ;
KAWANAKA, R ;
SHIMIZU, K .
THIN SOLID FILMS, 1980, 70 (01) :153-161
[8]  
GANGULEE A, 1973, METALL T, V4, P2073
[9]   FORMATION KINETICS OF INTERMETALLIC COMPOUNDS IN CU/SN THIN-FILMS [J].
HALIMI, R ;
CHPILEVSKI, EM ;
GORBATCHEVSKI, DA .
THIN SOLID FILMS, 1987, 148 (01) :109-119
[10]   COMPLETE CHARACTERIZATION OF THIN-FILM AND THICK-FILM MATERIALS USING WIDEBAND REFLECTION ACOUSTIC MICROSCOPY [J].
LEE, CC ;
TSAI, CS ;
CHENG, X .
IEEE TRANSACTIONS ON SONICS AND ULTRASONICS, 1985, 32 (02) :248-258