Adhesion strength and nucleation thermodynamics of four metals (Al, Cu, Ti, Zr) on AlN substrates

被引:29
作者
Tao, Yuan [1 ]
Ke, Genshui [1 ]
Xie, Yan [1 ]
Chen, Yigang [1 ]
Shi, Siqi [1 ]
Guo, Haibo [1 ]
机构
[1] Shanghai Univ, Sch Mat Sci & Engn, Dept Elect Informat Mat, Shanghai 200444, Peoples R China
基金
中国国家自然科学基金;
关键词
Aluminum nitride; Adhesion strength; Nucleation; Metallization; Density functional theory; BINDING-ENERGY RELATION; AUGMENTED-WAVE METHOD; ALUMINUM NITRIDE; UNIVERSAL FEATURES; EPITAXIAL-GROWTH; FILMS; GAN; DEPOSITION; MECHANISM; AIN;
D O I
10.1016/j.apsusc.2015.08.243
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Devices based on AlN generally require adherent and strong interfaces between AlN and other materials, whereas most metals are known to be nonwetting to AlN and form relatively weak interfaces with AlN. In this study, we selected four representative metals (Al, Cu, Ti, and Zr) to study the adhesion strength of the AlN/metal interfaces. Mathematical models were constructed between the adhesion strength and enthalpy of formation of Al-metal solid solutions, the surface energies of the metals, and the lattice mismatch between the metals and AlN, based on thermodynamic parameters calculated using density functional theory. It appears that the adhesion strength is mainly determined by the lattice mismatch, and is in no linear correlation with either the Al-metal solution's formation enthalpies or the metals' surface energies. We also investigated the nucleation thermodynamics of the four metals on AlN substrates. It was found that Ti forms the strongest interface with AlN, and has the largest driving force for nucleation on AIN substrates among the four metals. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:8 / 13
页数:6
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