Effect of nitrogen in the electronic structure of GaAsN and GaAsSb(N) compounds

被引:25
作者
Bousbih, F
Ben Bouzid, S
Chtourou, R
Charfi, FF
Harmand, JC
Ungaro, G
机构
[1] Inst Preparatorie Etud Sci & Tech, Unite Rech Phys Semicond, La Marsa 2070, Tunisia
[2] CNRS, Lab Photon & Nanostruct, F-91460 Marcoussis, France
来源
MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS | 2002年 / 21卷 / 1-2期
关键词
molecular beam epitaxy; low bandgap; nitrides; antimonides;
D O I
10.1016/S0928-4931(02)00075-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Bandgap energy of GaAs1-xN strained layers and of GaAs0.83Sb0.17/GaAs, GaAs0.74Sb0.25N0.01/GaAs quantum wells grown on (001) GaAs substrates by molecular beam epitaxy (MBE) were studied by absorption measurements. We have investigated the red-shift bandgap effect by the incorporation of low percentage of nitrogen in GaAs1-xNx strained layers with 0.1%<x<1.5%. At T=15 K, we have observed a red-shift of the band edge of about 250 meV for 1% of nitrogen. This effect has been explained by the band anticrossing (BAC) model in which the localized nitrogen states interact with the extended states of the conduction band of GaAs. We have also performed by absorption measurements the optical transitions of GaAsSb/GaAs and GaAsSbN/GaAs quantum well structures. To interpret the measurement results, we have used the envelope function approximation. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:251 / 254
页数:4
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