Influence of support material on formation of electrocatalytic thin films - A secondary ion mass spectrometry study

被引：5
|
作者：
Piccirillo, C
Daolio, S
Kristof, J
Mihaly, J
Facchin, B
Fabrizio, M
机构：
[1] CNR,IST POLAROG & ELETTROCHIM PREPARAT,I-35127 PADUA,ITALY
[2] UNIV VESZPREM,DEPT ANALYT CHEM,H-8201 VESZPREM,HUNGARY
来源：
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES | 1997年 / 161卷 / 1-3期
关键词：
secondary ion mass spectrometry; depth profiling; electrocatalysis; oxide film electrode; titanium dioxide; ruthenium dioxide; iridium dioxide;
D O I：
10.1016/S0168-1176(96)04531-4
中图分类号：
O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号：
070203 ; 070304 ; 081704 ; 1406 ;
摘要：
The influence of various support materials, such as nickel and titanium, on the structure of TiO2, RuO2, RuO2/TiO2 and IrO2/TiO2 electrocatalytic thin films was investigated in detail by secondary ion mass spectrometry (SIMS). The coatings were prepared by heat treatment following literature procedure. It is shown that various support materials can favor the formation and can influence the ion yield of ionic species with different oxidation states. The penetration characteristics of TiO2 in two-component systems on the same support are influenced by the nature of the noble metal. Furthermore, changes in the structure of the coatings due to method and time of storage may be detected by SIMS analysis. (C) 1997 Elsevier Science B.V.
引用
收藏
页码：141 / 149
页数：9
相关论文
共 50 条
  • [41] Time-of-flight secondary ion mass spectrometry in the helium ion microscope
    Klingner, N.
    Heller, R.
    Hlawacek, G.
    Facsko, S.
    von Borany, J.
    ULTRAMICROSCOPY, 2019, 198 : 10 - 17
  • [42] Characterization of electrodeposited metal coatings by secondary ion mass spectrometry
    Bardi, U
    Caporali, S
    Chenakin, SP
    Lavacchia, A
    Miorin, E
    Pagura, C
    Tolstogouzov, A
    SURFACE & COATINGS TECHNOLOGY, 2006, 200 (09): : 2870 - 2874
  • [43] SECONDARY-ION MASS-SPECTROMETRY OF GLYCOSYLATED PORPHYRINS
    SPIRO, M
    BLAIS, JC
    BOLBACH, G
    FOURNIER, F
    TABET, JC
    DRIAF, K
    GAUD, O
    GRANET, R
    KRAUSZ, P
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1994, 134 (2-3): : 229 - 238
  • [44] IMAGE-PROCESSING IN SECONDARY ION MASS-SPECTROMETRY
    VANHOOLST, WK
    VANESPEN, PJ
    MIKROCHIMICA ACTA, 1991, 2 (1-6) : 415 - 425
  • [45] Mesoscopic concentration variations analyzed by secondary ion mass spectrometry
    Kjellander, CBK
    van Ijzendoorn, LJ
    de Jong, AM
    Broer, DJ
    Niemantsverdriet, HJW
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2005, 434 : 499 - 510
  • [46] Secondary Ion Mass Spectrometry as an advanced tool for meteorite classification
    Novakova, Justina
    Jerigova, Monika
    Jane, Eduard
    Szoecs, Vojtech
    Velic, Dusan
    PLANETARY AND SPACE SCIENCE, 2020, 192
  • [47] CLUSTER SECONDARY ION MASS SPECTROMETRY OF POLYMERS AND RELATED MATERIALS
    Mahoney, Christine M.
    MASS SPECTROMETRY REVIEWS, 2010, 29 (02) : 247 - 293
  • [48] Isotope ratio measurements by secondary ion mass spectrometry (SIMS) and glow discharge mass spectrometry (GDMS)
    Betti, M
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 2005, 242 (2-3) : 169 - 182
  • [49] Influence of the Substrate Roughness on the Accuracy of Measuring the Impurity Depth Distribution by Secondary-Ion Mass Spectrometry
    A. S. Ghyngazov
    A. P. Surzhikov
    S. A. Ghyngazov
    Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques, 2021, 15 : 1191 - 1194
  • [50] Influence of the Substrate Roughness on the Accuracy of Measuring the Impurity Depth Distribution by Secondary-Ion Mass Spectrometry
    Ghyngazov, A. S.
    Surzhikov, A. P.
    Ghyngazov, S. A.
    JOURNAL OF SURFACE INVESTIGATION, 2021, 15 (06): : 1191 - 1194
12345