Microstructural characterization of Fe-N thin films

被引：16

作者：

Zhan, Q ^{[1
]}

Yu, R ^{[1
]}

He, LL ^{[1
]}

Li, DX ^{[1
]}

机构：

[1] Chinese Acad Sci, Met Res Inst, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China

来源：

THIN SOLID FILMS | 2002年 / 411卷 / 02期

基金：

中国国家自然科学基金;

关键词：

Fe-N film; microstructure; HREM;

D O I：

10.1016/S0040-6090(02)00289-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The microstructure of Fe-N films with different thicknesses prepared by reactive radio-frequency magnetron sputtering has been investigated by transmission electron microscopy (TEM) and high-resolution transmission electron micrscopy (HREM) in cross-section and plan view. The film showed a small surface roughening at a nanometer scale. Grain clusters were clearly visible in the film. The electron diffraction analysis indicated that the sputtered Fe-N film was polycrystalline with a mixture of alpha-Fe and alpha"-Fe16N2 phases. A small amount of Fe2O3 was also observed. The thickness of the film and crystal size may be important factors causing distinct differences in magnetic properties of sputtered Fe-N films. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：225 / 228

页数：4

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