Supercritical water oxidation of a PCB of 3-chlorobiphenyl using hydrogen peroxide

被引：32
作者：
Hatakeda, K
Ikushima, Y
Ito, S
Saito, N
Sato, O
机构：
[1] Natl. Industrial Research Institute, Miyagino-ku, Sendai 983, Tohoku
来源：
CHEMISTRY LETTERS | 1997年 / 03期
关键词：
D O I：
10.1246/cl.1997.245
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The supercritical water oxidation (SCWO) of a PCB of 3-chlorobiphenyl (1) was carried out at a temperature of 673 K and a pressure of 30 MPa with a flow reactor. The initial concentrations of (1) and hydrogen peroxide ranged from 1.84 X 10(-3) to 8.74 X 10 (-2) M (1 M=1 mol dm (-3)), and 0.181 to 2.67 M, respectively. The decomposition of (1) was higher than 99.9% so long as hydrogen peroxide was stoichiometrically added.
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页码：245 / 246
页数：2
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