MBE growth of MnTe/ZnTe superlattices on GaAs (100) vicinal substrates

被引:4
作者
Suzuki, T [1 ]
Ishibe, I [1 ]
Nabetani, Y [1 ]
Kato, T [1 ]
Matsumoto, T [1 ]
机构
[1] Yamanashi Univ, Fac Engn, Dept Elect Engn, Kofu, Yamanashi 4008511, Japan
关键词
low-dimensional structures; reflection high energy electron diffraction; molecular beam epitaxy; manganites; zinc compounds; semiconducting IIVI materials;
D O I
10.1016/S0022-0248(01)02186-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
MnTe/ZnTe and MnSe/ZnSe superlattices are grown by molecular beam epitaxy (MBE) on GaAs(1 0 0) substrates 5degrees vicinal toward [0 (1) over bar 1] direction. Crystal structures, lateral lattice spacings, and atomic step arrays on the growing surface are investigated by in situ reflection high energy electron diffraction (RHEED). The superlattices are grown on ZnTe or ZnSe buffer layers which are lattice relaxed with respect to the GaAs substrate and have uniform array of atomic steps on the surface. MnTe and MnSe layers grow coherently, respectively, on the ZnTe and ZnSe buffer layers and show RHEED patterns indicating a uniform array of atomic steps when their thicknesses are smaller than 1-2ML. High-quality (MnTe/ZnTe)(60) and (MnSe/ZnSe)(60) vicinal superlattices can be prepared for the MnTe or MnSe layers thinner than 1-2 ML. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1374 / 1377
页数:4
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