Plasma diagnostics for understanding the plasma-surface interaction in HiPIMS discharges: a review

被引：109

作者：

Britun, Nikolay ^{[1
]}

Minea, Tiberiu ^{[2
]}

Konstantinidis, Stephanos ^{[1
]}

Snyders, Rony ^{[1
,3
]}

机构：

[1] Univ Mons, CIRMAP, Chim Interact Plasma Surface ChIPS, B-7000 Mons, Belgium

[2] Univ Paris Sud, CNRS, LPGP, UMR 8578, F-91405 Orsay, France

[3] Mat Nova Res Ctr, B-7000 Mons, Belgium

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2014年 / 47卷 / 22期

关键词：

plasma diagnostics; plasma-surface interaction; high-power impulse magnetron sputtering; reactive sputtering; time-resolved; spectroscopy; LASER-INDUCED FLUORESCENCE; PHYSICAL VAPOR-DEPOSITION; OPTICAL-EMISSION SPECTROSCOPY; PULSED MAGNETRON DISCHARGES; INDUCTIVELY-COUPLED PLASMA; DIELECTRIC BARRIER DISCHARGE; LANGMUIR PROBE MEASUREMENTS; NEUTRAL GAS TEMPERATURE; THIN-FILM DEPOSITION; MASS-SPECTROMETRY;

D O I：

10.1088/0022-3727/47/22/224001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The physical and chemical aspects of plasma-surface interaction in high-power impulse magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various plasma diagnostic methods representing the important sputtering discharge regions, namely the cathode vicinity, plasma bulk, and substrate vicinity, are reported. After a detailed introduction to the problem and description of the plasma characterization methods suitable for pulsed magnetron discharge analysis, an overview of the recent plasma diagnostics achievements in both non-reactive and reactive HiPIMS discharges is presented. Finally, the conclusions and perspectives suggesting possible directions and research strategies for increasing our knowledge in this domain are given.

引用

页数：46

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