Hydrogenated poly(p-vinylphenol) for microlithography

The characterization of partially hydrogenated poly(p-vinylphenol)s was carried out. By hydrogenation, oxidized sites of the polymers such as quinoid were reduced and the phenolic moiety; was converted to cyclohexanolic structure. Accompanied with the structural changes, Light transmittance was improved in a wide range of wavelength from visible to the deep-UV region. As the degree of hydrogenation increased, the alkali dissolution rate decreased, while the polymers showed very constant glass transition temperatures and etch durabilities to CF/ O-2 plasma. These properties of hydrogenated poly(p-vinylphenol)s are considered to be suitable for a variety of photosensitive applications, especially photoresist materials for microlithography under deep-UV exposure.