Wafer scale BN on sapphire substrates for improved graphene transport

被引:28
作者
Vangala, Shivashankar [1 ]
Siegel, Gene [1 ,2 ]
Prusnick, Timothy [1 ,2 ]
Snure, Michael [1 ]
机构
[1] Air Force Res Lab, Sensors Directorate, Wright Patterson AFB, OH 45433 USA
[2] KBR Wyle Labs, Beavercreek, OH 45433 USA
来源
SCIENTIFIC REPORTS | 2018年 / 8卷
关键词
HIGH-QUALITY; GROWTH; TRANSISTORS; HYSTERESIS; EXTRACTION; SCATTERING;
D O I
10.1038/s41598-018-27237-z
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Wafer scale (2 '') BN grown by metal organic chemical vapor deposition (MOCVD) on sapphire was examined as a weakly interacting dielectric substrate for graphene, demonstrating improved transport properties over conventional sapphire and SiO2/Si substrates. Chemical vapor deposition grown graphene was transferred to BN/sapphire substrates for evaluation of more than 30 samples using Raman and Hall effects measurements. A more than 2x increase in Hall mobility and 10x reduction in sheet carrier density was measured for graphene on BN/sapphire compared to sapphire substrates. Through control of the MOCVD process, BN films with roughness ranging from <0.1 nm to >1 nm were grown and used to study the effects of substrate roughness on graphene transport. Arrays of graphene field effect transistors were fabricated on 2 '' BN/sapphire substrates demonstrating scalability and device performance enhancement.
引用
收藏
页数:9
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