Vertical ordering in multilayers of self-assembled Ge/Si(001) quantum dots

被引:8
作者
Le Thanh, V
Yam, V
Nguyen, LH
Zheng, Y
Boucaud, P
Débarre, D
Bouchier, D
机构
[1] Univ Paris 11, Inst Elect Fondamentale, CNRS, UMR 8622, F-91405 Orsay, France
[2] Univ Paris 06, CNRS, Lab Mineral Cristallog, UMR 7590, F-75252 Paris 5, France
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2002年 / 20卷 / 03期
关键词
D O I
10.1116/1.1456522
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effect of vertical ordering in multilayers of self-assembled Ge/Si(001) quantum dots was investigated by a combination of structural and optical characterizations via in situ reflection high-energy electron diffraction, transmission electron microscopy, atomic force microscopy, and photoluminescence spectroscopy. We show that the vertical ordering observed in quantum-dot multilayers is characterized not only by the alignment of islands along the growth direction but also by a reduction of the critical thickness. The better the vertical ordering, the more pronounced the reduction of the critical thickness is observed. Such an evolution of the critical thickness could be explained by elastic strain fields induced by buried islands and propagate through the spacer layers. An important result issued from this work is the realization of multilayers in which dots have equal size in all layers. Furthermore, experiments performed on the transformation of the island shape suggest that preferential nucleation induced by surface roughness may be the main mechanism responsible for the vertical ordering in quantum-dot multilayers. (C) 2002 American Vacuum Society.
引用
收藏
页码:1259 / 1265
页数:7
相关论文
共 33 条
  • [1] Growth and characterization of self-assembled Ge-rich islands on Si
    Abstreiter, G
    Schittenhelm, P
    Engel, C
    Silveira, E
    Zrenner, A
    Meertens, D
    Jager, W
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1996, 11 (11) : 1521 - 1528
  • [2] Surface smoothing induced by epitaxial Si capping of rough and strained Ge or Si1-xGex morphologies:: a RHEED and TEM study
    Dentel, D
    Bischoff, JL
    Kubler, L
    Werckmann, J
    Romeo, M
    [J]. JOURNAL OF CRYSTAL GROWTH, 1998, 191 (04) : 697 - 710
  • [3] DISLOCATION-FREE STRANSKI-KRASTANOW GROWTH OF GE ON SI(100)
    EAGLESHAM, DJ
    CERULLO, M
    [J]. PHYSICAL REVIEW LETTERS, 1990, 64 (16) : 1943 - 1946
  • [4] Strain induced vertical and lateral correlations in quantum dot superlattices
    Holy, V
    Springholz, G
    Pinczolits, M
    Bauer, G
    [J]. PHYSICAL REVIEW LETTERS, 1999, 83 (02) : 356 - 359
  • [5] Germanium "quantum dots" embedded in silicon:: Quantitative study of self-alignment and coarsening
    Kienzle, O
    Ernst, F
    Rühle, M
    Schmidt, OG
    Eberl, K
    [J]. APPLIED PHYSICS LETTERS, 1999, 74 (02) : 269 - 271
  • [6] Vertically self-organized Ge/Si(001) quantum dots in multilayer structures
    Le Thanh, V
    Yam, V
    Boucaud, P
    Fortuna, F
    Ulysse, C
    Bouchier, D
    Vervoort, L
    Lourtioz, JM
    [J]. PHYSICAL REVIEW B, 1999, 60 (08) : 5851 - 5857
  • [7] Nucleation and growth of self-assembled Ge/Si(001) quantum dots
    Le Thanh, V
    Boucaud, P
    Debarre, D
    Zheng, Y
    Bouchier, D
    Lourtioz, JM
    [J]. PHYSICAL REVIEW B, 1998, 58 (19): : 13115 - 13120
  • [8] Low-temperature formation of Si(001) 2×1 surfaces from wet chemical cleaning in NH4F solution
    Le, Thanh, Vinh
    Bouchier, D.
    Hincelin, G.
    [J]. Journal of Applied Physics, 2000, 87 (08)
  • [9] On the formation of self-assembled Ge/Si(001) quantum dots
    Le Thanh, V
    Boucaud, P
    Zheng, Y
    Younsi, A
    Débarre, D
    Bouchier, D
    Lourtioz, JM
    [J]. JOURNAL OF CRYSTAL GROWTH, 1999, 201 : 1212 - 1217
  • [10] New insight into the kinetics of Stranski-Krastanow growth of Ge on Si(001)
    Le Thanh, V
    [J]. SURFACE SCIENCE, 2001, 492 (03) : 255 - 269