Ion-beam excitation of liquid argon

被引:17
|
作者
Hofmann, M. [1 ]
Dandl, T. [2 ]
Heindl, T. [2 ]
Neumeier, A. [1 ]
Oberauer, L. [1 ]
Potzel, W. [1 ]
Roth, S. [1 ]
Schoenert, S. [1 ]
Wieser, J. [2 ]
Ulrich, A. [2 ]
机构
[1] Tech Univ Munich, Phys Dept E15, D-85748 Garching, Germany
[2] Tech Univ Munich, Phys Dept E12, D-85748 Garching, Germany
来源
EUROPEAN PHYSICAL JOURNAL C | 2013年 / 73卷 / 10期
关键词
SCINTILLATION YIELDS; MULTIPLE-IONIZATION; EMISSION-SPECTRA; CROSS-SECTIONS; RECOIL IONS; GAS; LUMINESCENCE; KRYPTON; XENON; DEPENDENCE;
D O I
10.1140/epjc/s10052-013-2618-0
中图分类号
O412 [相对论、场论]; O572.2 [粒子物理学];
学科分类号
摘要
The scintillation light of liquid argon has been recorded wavelength and time resolved with very good statistics in a wavelength interval ranging from 118 nm through 970 nm. Three different ion beams, protons, sulfur ions and gold ions, were used to excite liquid argon. Only minor differences were observed in the wavelength-spectra obtained with the different incident particles. Light emission in the wavelength range of the third excimer continuum was found to be strongly suppressed in the liquid phase. In time-resolved measurements, the time structure of the scintillation light can be directly attributed to wavelength in our studies, as no wavelength shifter has been used. These measurements confirm that the singlet-to-triplet intensity ratio in the second excimer continuum range is a useful parameter for particle discrimination, which can also be employed in wavelength-integrated measurements as long as the sensitivity of the detector system does not rise steeply for wavelengths longer than 190 nm. Using our values for the singlet-to-triplet ratio down to low energies deposited a discrimination threshold between incident protons and sulfur ions as low as similar to 2.5 keV seems possible, which represents the principle limit for the discrimination of these two species in liquid argon.
引用
收藏
页码:1 / 16
页数:16
相关论文
共 50 条
  • [31] The bond energy of ReO+: Guided ion-beam and theoretical studies of the reaction of Re+ (7S) with O2
    Armentrout, P. B.
    JOURNAL OF CHEMICAL PHYSICS, 2013, 139 (08)
  • [32] ION-BEAM MILLING-INDUCED DAMAGE IN ALGAAS GAAS ALGAAS SINGLE QUANTUM-WELL
    SWAMINATHAN, V
    PRZYBYLEK, GJ
    GUTH, G
    ASOM, MT
    ELECTRONICS LETTERS, 1991, 27 (25) : 2320 - 2322
  • [33] Magnetic annealing of the ion-beam sputtered IrMn/CoFeB bilayers - positive exchange bias and coercivity behaviour
    Raju, M.
    Chaudhary, Sujeet
    Pandya, D. K.
    EUROPEAN PHYSICAL JOURNAL B, 2013, 86 (12)
  • [34] Fabrication of IZO transparent conducting thin films by the use of magnetron sputtering equipped with ion-beam system
    Jung, Jae-Hye
    Lee, Se-Jong
    Hwang, Hyeon Seok
    Baik, Hong Koo
    Cho, Nam-Ihn
    JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, 2009, 17 (09) : 745 - 750
  • [35] Electron-ion recombination in radiation tracks in liquid argon: a computer simulation study
    Jaskolski, Michal
    Wojcik, Mariusz
    RESEARCH ON CHEMICAL INTERMEDIATES, 2009, 35 (04) : 453 - 463
  • [36] Study of nuclear recoils in liquid argon with monoenergetic neutrons
    Regenfus, C.
    Allkofer, Y.
    Amsler, C.
    Creus, W.
    Ferella, A.
    Rochet, J.
    Walter, M.
    12TH INTERNATIONAL CONFERENCE ON TOPICS IN ASTROPARTICLE AND UNDERGROUND PHYSICS (TAUP 2011), PTS 1-6, 2012, 375
  • [37] Luminescence kinetics of PbWO4 crystal at excitation by H+ ion beam
    Egorov, VK
    Egorov, EV
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2001, 179 (04) : 536 - 542
  • [38] Feasibility study of nuclear excitation by electron capture using an electron beam ion trap
    Wang, Yumiao
    Ma, Zhiguo
    Yang, Yi
    Fu, Changbo
    He, Wanbing
    Ma, Yugang
    FRONTIERS IN PHYSICS, 2023, 11
  • [39] Modelling electroluminescence in liquid argon
    Stewart, D. Y.
    Barker, G. J.
    Bennieston, A. J.
    Harrison, P. F.
    Lightfoot, P. K.
    McConkey, N.
    Morgan, B.
    Ramachers, Y. A.
    Robinson, M.
    Spooner, N. J. C.
    Thompson, L.
    JOURNAL OF INSTRUMENTATION, 2010, 5
  • [40] Effect of ion-beam treatment during reactive high-frequency magnetron sputtering on macrostresses in ITO films
    Krylov, P. N.
    Zakirova, R. M.
    Fedotova, I. V.
    SEMICONDUCTORS, 2014, 48 (06) : 743 - 747