Energy distribution of O- ions during reactive magnetron sputtering

被引:78
|
作者
Mraz, Stanislav [1 ]
Schneider, Jochen M. [1 ]
机构
[1] Rhein Westfal TH Aachen Univ, D-52074 Aachen, Germany
关键词
D O I
10.1063/1.2266888
中图分类号
O59 [应用物理学];
学科分类号
摘要
Low, medium, and high energy O- ion populations were experimentally detected during magnetron sputtering of Al in an Ar/O-2 atmosphere. Based on calculations, the authors propose that nonsputtered O- ions originating from the target surface are accelerated in the cathode fall, while sputtered O- ions may be excluded as a significant contribution to the high energy ion population. Furthermore, the formation of medium energy O- ions is consistent with the notion of sputtered, in the cathode fall accelerated, and subsequently dissociated AlO- and AlO2- clusters. These findings may be of importance for understanding plasma energetics and growth involving electronegative species.
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页数:3
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